Ion Beam Induced Effects in RF Plasma Chemical Vapor Deposition Deposited Hydrogenated Amorphous Carbon Thin Films

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2003-08-15

著者

• SOGA Tetsuo

  Department of Frontier Materials, Nagoya Institute of Technology

• Soga Tetsuo

  Department Of Electronics Faculty Of Engineering Nagoya University

• Soga Tetsuo

  Department Of Environmental Technology And Urban Planning Nagoya Institute Of Technology

• Narayanan K

  Department Of Environmental Technology And Urban Planning Nagoya Institute Of Technology

• Yamaguchi Masafumi

  Semiconductor Research Center Toyota Technological Institute

• NARAYANAN Kannan

  Department of Physical Electronics, Tokyo Institute of Technology

• Narayanan Kannan

  Department Of Environmental Technology And Urban Planning Nagoya Institute Of Technology

• OSHITA Yoshio

  Semiconductor Research Center, Toyota Technological Institute

• Oshita Yoshio

  Semiconductor Research Center Toyota Technological Institute

• Soga Tetsuo

  Department of Electrical and Computer Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466

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