Yamaguchi Masafumi | Semiconductor Research Center Toyota Technological Institute
スポンサーリンク
概要
関連著者
-
Yamaguchi Masafumi
Semiconductor Research Center Toyota Technological Institute
-
Soga Tetsuo
Department Of Electronics Faculty Of Engineering Nagoya University
-
Narayanan Kannan
Department Of Environmental Technology And Urban Planning Nagoya Institute Of Technology
-
Soga Tetsuo
Department of Electrical and Computer Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466
-
SOGA Tetsuo
Department of Frontier Materials, Nagoya Institute of Technology
-
Narayanan K
Department Of Environmental Technology And Urban Planning Nagoya Institute Of Technology
-
NARAYANAN Kannan
Department of Physical Electronics, Tokyo Institute of Technology
-
EKINS-DAUKES Nicholas
Semiconductor Research Center, Toyota Technological Institute
-
Soga Tetsuo
Department Of Environmental Technology And Urban Planning Nagoya Institute Of Technology
-
Tokunaga Tomoharu
Department Of Environmental Technology And Urban Planning Nagoya Institute Of Technology
-
OSHITA Yoshio
Semiconductor Research Center, Toyota Technological Institute
-
Oshita Yoshio
Semiconductor Research Center Toyota Technological Institute
-
Narayanan Kannan
Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan
-
Yamaguchi Masafumi
Semiconductor Research Center, Toyota Technological Institute, 2-12-1 Hisakata, Tempaku, Nagoya 468-8511, Japan
-
Yamaguchi Masafumi
Semiconductor Research Center, Toyota Technological Institute, 2-12-1 Hisakata, Tempaku-ku, Nagoya 468-8511, Japan
-
Tokunaga Tomoharu
Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan
著作論文
- Rectifying I-V Characteristics of n-Type Fluorine Implanted a-C/p-Type Si Heterojunction Diodes
- Ion Beam Induced Effects in RF Plasma Chemical Vapor Deposition Deposited Hydrogenated Amorphous Carbon Thin Films
- Rectifying I-V Characteristics of n-Type Fluorine Implanted a-C/p-Type Si Heterojunction Diodes
- Ion Implantation Effects of Microcrystalline and Nanocrystalline Diamond Thin Films