Oizumi Hiroaki | Central Research Laboratory Hitachi Ltd.
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概要
関連著者
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Oizumi Hiroaki
Central Research Laboratory Hitachi Ltd.
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MOCHIJI Kozo
Central Research Laboratory, Hitachi Ltd.
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Mochiji Kozo
Central Research Laboratory Hitachi Ltd.
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Oizumi H
Hitachi Ltd. Tokyo Jpn
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Oizumi H
Aset Euvl Lab. Kanagawa Jpn
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Oizumi Hiroaki
Sortec Corporation
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Mochiji K
Joint Res. Center For Atom Technol. Angstrom Technol. Partnership(jrcat‐atp) Ibaraki Jpn
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Soga Tetsuo
Department Of Electronics Faculty Of Engineering Nagoya University
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OGAWA Taro
Central Research Laboratory, Hitachi Ltd.
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Soga T
Nagoya Inst. Technol. Nagoya Jpn
著作論文
- Polymer Dissolution Characteristics of Radiation-Induced Grafted Resist in X-Ray Lithography
- High-Quality Carbon-Doped Boron Nitride Membrane for X-Ray Lithography Mask
- Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors
- Influence of Oxygen upon Radiation Durability of SiN X-Ray Mask Membranes : Lithography Technology
- Influence of Oxygen upon Radiation Durability of SiN X-ray Mask Membranes
- X-Ray Mask Technology Utilizing an Optical Stepper
- X-ray Mask Technology utilizing an Optical Stepper : X-Ray Lithography