Overlay Accuracy Measurement Technique Using the Latent Image on a Chemically Amplified Resist
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-01-15
著者
-
ENDO Masamori
Department of Physics, School of Science, Tokai University
-
Endo M
Department Of Physics School Of Science Tokai University
-
Yamashita K
Graduate School Of Engineering Osaka Prefecture University
-
Yamashita Kazuhiro
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
-
Endo Masayuki
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
-
Katsuyama Akiko
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
-
Kobayashi Satoshi
Semiconductor Research Center, Matsushita Electric Industrial Co. Ltd.
-
Yamashita K
Osaka Prefecture Univ. Sakai‐shi Jpn
-
MURO Masahiro
Semiconductor Research Center, Matsushita Electric Industrial, Co., Ltd.
-
Yamashita Kazuhiro
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
-
Katsuyama A
Osaka Prefecture Univ. Osaka Jpn
-
Muro Masahiro
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
-
Endo Masayuki
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
関連論文
- 化学酸素沃素レーザー(Chemical Oxygen-Iodine Laser : COIL)の原子炉解体への応用
- Performance Comparison of Real-Time Laser Absorption Spectrometers for NH_3 Detection at 1.54 and 3.03μm in a H_2O Vapor Mixture
- Measurements of NO_2 Concentration with Wide Dynamic Range Based on Laser Absorption Spectroscopy Using a Multi-Pass Optical Cell : Effects of Ambient Temperature Change at the Optical Cell
- Parametric Studies on Improved Laser Cutting Performance of Magnesium Alloy with Two Flow Nozzles
- Trace Methane Detection Based on Raman Spectroscopy Using a High Finesse Optical Resonator
- Performance Characteristics of Power Build-Up Cavity for Raman Spectroscopic Measurement
- A Novel Channel Estimation and Equalization for MIMO-OFDM Systems
- Channel Estimation for Mobile OFDM Systems Using CR Splines
- Fractionally Spaced Bayesian Decision Feedback Equalizer(Regular Section)
- A New Class of Acoustic Echo Cancelling by Using Correlation LMS Algorithm for Double-Talk Condition(Speech/Acoustic Signal Processing)(Digital Signal Processing)
- A New Frequency Domain Implementation of ECLMS Algorithm for Double-Talk Echo Canceling
- Application of a Noise-Smoothing Filter Based on Adaptive Windowing to Penumbral Imaging
- A Design Method of an Adaptive Joint-Process IIR Filter with Generalized Lattice Structure
- "Mask Enhancer" Technology on ArF Immersion Tool for 45-nm-Node Complementary Metal Oxide Semiconductor with 0.249μm^2 Static Random Access Memory Contact Layer Fabrication
- Sob-0.1-μm-Pattern Fabrication Using a 193-nm Top Surface Imaging (TSI) Process
- Advanced Surface Modification Resist Process for ArF Lithography
- New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns (Special Issue on Quarter Micron Si Device and Process Technologies)
- Quarter Micron KrF Excimer Laser Lithography (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- Removal of Water Vapor in a Mist Singlet Oxygen Generator for Chemical Oxygen Iodine Laser
- Development of a Mist Singlet Oxygen Generator
- 霧化型励起酸素発生器の基礎研究III
- Numerical Simulation of a Mist Singlet Oxygen Generator(Optics and Quantum Electronics)
- 霧化型励起酸素発生器の基礎研究II
- 霧化型励起酸素発生器の基礎研究
- Two-Dimensional Simulation of and Experiments on the Forward-Backward Modes Coupled Unstable Resonator
- Output Power Enhancement of a Chemical Oxygen-Iodine Laser by Predissociated Iodine Injection
- 化学酸素沃素レーザー(Chemical Oxygen Iodine Laser : COIL)の高圧力動作
- A New Photobleachable Positive Resist for KrF Excimer Laser Lithography : Advanced III-V Compound Semiconductors and Silicon Devices(Solid State Devices and Materials 1)
- A KrF Excimer Laser Lithography for Half Micron Devices : Techniques, Instrumentations and Measurement
- 沃素のマイクロ波放電解離を用いた超音速化学酸素沃素レーザ
- Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193nm Lithography II : Protection Groups Containing an Adamantyl Unit
- Timing Jitter Reduction in a Passively Mode-Locked Fiber Laser
- Generation of Tunable Pulses below 345 fs Using a Passively Mode-Locked Fiber Ring Laser with Bulk Components
- Waveform Shaping of a Chemical Oxygen-Iodine Laser Utilizing the Zeeman Effect
- 化学酸素沃素レーザーの磁場によるパルス発振
- 化学酸素沃素レーザの磁場による出力制御
- Finding Method of Radiated Emission Sources with Arbitrary Directional Current Components Utilizing CISPR Measurement System
- Estimation of Horizontally Polarized Radiated Emission Sources Based on CISPR Measurement System(Special Issue on Recent Progress in Electromagnetic Compatibility Technology)
- Overlay Accuracy Measurement Technique Using the Latent Image on a Chemically Amplified Resist
- CDV Tolerance for the Mapping of ATM Cells onto the Physical Layer
- A New Analytical Technique for Evaluating Standing Wave Effect of Chemically Amplified Positive Resist
- Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength
- Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer(Instrumentation, Measurement, and Fabrication Technology)
- New Evaluation Method of Resist Coating Using Heterodyne Holographic Wafer Alignment
- レーザー オリジナル Development of a Nitrogen Dioxide Gas Sensor Based on Mid-Infrared Absorption Spectroscopy
- Cutting and Drilling of Inorganic Materials for Civil Engineering Using a Chemical Oxygen-Iodine Laser
- Extension of the ArF Excimer Lithography to Sub-0.10/μm Design Rule Devices Using Bi-layer Silylation Process
- Sub-0.10 μm Hole Fabrication Using Bilayer Silylation Process for 193 nm Lithography
- Application of Photobleachable Positive Resist and contrast Enhancement Material to KrF Excimer Laser Lithography : Resist Material and Process
- Computer Aided Proximity Effect Correction System in Photolithography : Lithography Technology
- 光力システムにおける窒素を用いた高効率超音速化学酸素沃素レーザー
- 光力システムにおける超音速化学励起沃素レーザーの新型 Jet type 励起酸素発生器の動作特性
- Novel Silicon-Containing Negative Resist for Bilayer Application in Electron Beam Direct Writing
- Application of Photobleachable Positive Resist and Contrast Enhancement Material to KrF Excimer Laser Lithography
- Development Methods for Submicron Optical Lithography
- High-Aspect-Ratio Alkaline Surface Treatment Method of Dyed Photoresist
- Computer Aided Proximity Effect Correction System in Photolithography