High-Aspect-Ratio Alkaline Surface Treatment Method of Dyed Photoresist
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概要
- 論文の詳細を見る
Contrast enhancement by alkaline surface treatment of dyed photoresist is characterized. A surface-modified layer formed by the alkaline surface treatment prevents unexposed areas of the resist from being dissolved and acts as a barrier during development. Utilizing alkaline surface treatment, high-aspect-ratio submicron patterns on a highly reflective substrate are successfully delineated with negligible resist thickness loss. It is found that this modified process is enhanced by baking before exposure.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1989-03-20
著者
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Matsuoka Kouji
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Nomura Noboru
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Sasago Masaru
Semiconductor Research Center Matsushita Electric Industrial Co. Lid.
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Endo Masayuki
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Sasago Masaru
Semiconductor Research Center, Matsushita Electric Ind. Co., Ltd., Moriguchi 570
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Matsuoka Kouji
Semiconductor Research Center, Matsushita Electric Ind. Co., Ltd., Moriguchi 570
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