Tunnel Structured Stacked Capacitor Cell (TSSC) with High Reliability for 64 Mbit dRAMs and Formation of Oxide-Nitride-Oxide Film (ONO) on 3-dimensionally (3d) Storage Electrode
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-12-30
著者
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MATSUO Naoto
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
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Nakata Yoshiro
Semiconductor Research Center Matsushita Electric Industrial Co. Lid.
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Sasago Masaru
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Sasago Masaru
Semiconductor Research Center Matsushita Electric Industrial Co. Lid.
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Ogawa Hisashi
Semiconductor Research Center Matsushita Electric Industrial Co. Lid.
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Matsumoto S
Department Of Information And Physical Sciences Graduate School Of Information Science And Technolog
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YABU Toshiki
Semiconductor Research Center, Matsushita Electric Industrial Co., Lid.
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MATSUMOTO Susumu
Semiconductor Research Center, Matsushita Electric Industrial Co., Lid.
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OKADA Shozo
Semiconductor Research Center, Matsushita Electric Industrial Co., Lid.
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Matsuo Naoto
Semiconductor Research Center Matsushita Electric Industrial Co. Lid.
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Okada Shozo
Semiconductor Research Center Matsushita Electric Industrial Co. Lid.
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Yabu Toshiki
Semiconductor Research Center Matsushita Electric Industrial Co. Lid.
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