Quantitative Evaluation of Gate Oxide Damage during Plasma Processing Using Antenna-Structure Capacitors
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-01-15
著者
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Eriguchi K
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Eriguchi Koji
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Eriguchi Koji
Semiconductor Research Center Matsushita Electric Ind. Co. Ltd.
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NAKAGAWA Hideo
Semiconductor Company, Matsushita Electric Industrial Co. Ltd.
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Nomura Noboru
Semiconductor Research Center, Matsushita Electric Industrial Company, Ltd.
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Nomura N
Semiconductor Research Center Matsushita Electric Industrial Company Ltd.
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Nomura Noboru
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Kubota M
Opto-electronics Laboratories Oki Electric Industry Co. Ltd.
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KUBOTA Masafumi
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
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Uraoka Yukiharu
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
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Tamaki Tokuhiko
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
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Kubota Masafumi
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Uraoka Y
Nara Inst. Of Sci. And Technol. Nara Jpn
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Uraoka Yukiharu
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Uraoka Yukiharu
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Tamaki Tokuhiko
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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