High-Pressure Water Vapor Heat Treatment for Enhancement of SiOx or SiNx Passivation Layers of Silicon Solar Cells
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概要
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For the production of low-cost and high-efficiency silicon solar cells, it is necessary to develop high-quality passivation techniques at low temperatures. In this study, we propose high-pressure water vapor heat treatment (HWT) as a technique for modifying the passivation layers of silicon solar cells at low temperatures. HWT at approximately 300 °C was performed on mono- and multicrystalline silicon solar cells with SiOx or SiNx passivation layers formed by plasma-enhanced chemical vapor deposition at 300 °C. After the treatment, the improvement of passivation effect was confirmed by better photovoltaic performance, electroluminescence emission intensity, and effective minority carrier lifetime. Fourier transform infrared spectrometry proved that HWT caused the formation of a Si–O–Si bonding network that terminates the silicon dangling bonds at the surface or at defects, resulting in reduced recombination.
- 2009-06-25
著者
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Fuyuki Takashi
Graduate School Of Material Science Nara Institute Of Science And Technology
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Uraoka Yukiharu
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Ogane Akiyoshi
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Fuyuki Takashi
Graduate School of Materials Science, Nara Institute of Science and Technology (NAIST), 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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Kitiyanan Athapol
Graduate School of Materials Science, Nara Institute of Science and Technology (NAIST), 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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Uraoka Yukiharu
Graduate School of Material Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan
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Ogane Akiyoshi
Graduate School of Materials Science, Nara Institute of Science and Technology (NAIST), 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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