Fabrication of Zinc Oxide Nanopatterns by Quick Gel-Nanoimprint Process toward Optical Switching Devices
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概要
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We proposed a quick patterning method using a gel-nanoimprint process to fabricate a photonic crystal layer using zinc oxide (ZnO). The X-ray diffraction measurement revealed that the ZnO layer had a wurtzite structure by annealing in air or oxygen ambient. We demonstrated the nanopatterning with a short imprinting time of 5 min by the gel-nanoimprint process. We achieved shrinkage factors of ZnO nanopatterns of as low as 8 and 3% in the width and height directions, respectively. In addition, the uniformity in size of the patterned area was found to be 3% in our process, suggesting that the gel-nanoimprint process allows us to fabricate optical switching devices.
- 2013-03-25
著者
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Horita Masahiro
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Ishikawa Yasuaki
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Uraoka Yukiharu
Graduate School of Material Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan
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Uraoka Yukiharu
Graduate School of Materials Science, Nara Institute of Science and Technology, Ikoma, Nara 630-0192, Japan
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Doe Takahiro
Graduate School of Materials Science, Nara Institute of Science and Technology, Ikoma, Nara 630-0192, Japan
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Lu Li
Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama-cho, Ikoma, Nara 630-0192, Japan
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Nishida Takashi
Graduate School of Material Science, Nara Institute of Science and Technology (NAIST), 8916-5 Takayama-cho, Ikoma, Nara 630-0192, Japan
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Araki Shinji
Graduate School of Materials Science, Nara Institute of Science and Technology, Ikoma, Nara 630-0192, Japan
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Zhang Min
Graduate School of Materials Science, Nara Institute of Science and Technology, Ikoma, Nara 630-0192, Japan
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