Low-Temperature-Processed Zinc Oxide Thin-Film Transistors Fabricated by Plasma-Assisted Atomic Layer Deposition (Special Issue : Solid State Devices and Materials (1))

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概要

• 論文の詳細を見る

著者

• Horita Masahiro

  Graduate School Of Materials Science Nara Institute Of Science And Technology

• Ishikawa Yasuaki

  Graduate School Of Materials Science Nara Institute Of Science And Technology

• Kawamura Yumi

  Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0192, Japan

• Uraoka Yukiharu

  Graduate School of Material Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan

• Hattori Nozomu

  Mitsui Engineering and Shipbilding Co., Ltd., 3-16-1 Tamahara, Tamano, Okayama 706-0014, Japan

• Miyatake Naomasa

  Mitsui Engineering and Shipbilding Co., Ltd., 3-16-1 Tamahara, Tamano, Okayama 706-0014, Japan

• Tani Mai

  Graduate School of Materials Science, Nara Institute of Science and Technology, Ikoma, Nara 630-0192, Japan

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