ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
スポンサーリンク
概要
- 論文の詳細を見る
We investigated zinc oxide (ZnO) thin films prepared by plasma-assisted atomic layer deposition (PA-ALD), and thin film transistors (TFTs) with the ALD ZnO channel layer for application to next-generation displays. The dependences of the electrical characteristics of the fabricated TFTs on the plasma condition were evaluated. The plasma injection time dependence of the transfer characteristics, the refractive index, and the impurity concentration revealed that insufficient oxidation degrades the performance of ZnO TFTs. On the basis of the experimental results, high-performance ZnO TFTs can be obtained by PA-ALD at a low temperature.
- 2011-04-25
著者
-
Horita Masahiro
Graduate School Of Materials Science Nara Institute Of Science And Technology
-
Uraoka Yukiharu
CREST, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan
-
Kawamura Yumi
Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
-
Horita Masahiro
Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
-
Hattori Nozomu
Mitsui Engineering and Shipbilding Co., Ltd., 3-16-1 Tamahara, Tamano, Okayama 706-0014, Japan
-
Miyatake Naomasa
Mitsui Engineering and Shipbilding Co., Ltd., 3-16-1 Tamahara, Tamano, Okayama 706-0014, Japan
関連論文
- ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
- Unique Phenomenon in Degradation of Amorphous In_2O_3-Ga_2O_3-ZnO Thin-Film Transistors under Dynamic Stress
- Thin-Film Devices Fabricated on Double-Layered Polycrystalline Silicon Films Formed by Green Laser Annealing (Special Issue : Active-Matrix Flatpanel Displays and Devices : TFT Technologies and FPD Materials)
- Low-Temperature-Processed Zinc Oxide Thin-Film Transistors Fabricated by Plasma-Assisted Atomic Layer Deposition (Special Issue : Solid State Devices and Materials (1))
- Size Control of ZnS Nanoparticles by Electro-Spray Deposition Method
- Effect of Post-Thermal Annealing of Thin-Film Transistors with ZnO Channel Layer Fabricated by Atomic Layer Deposition
- Fabrication of Zinc Oxide Nanopatterns by Quick Gel-Nanoimprint Process toward Optical Switching Devices