Nomura N | Semiconductor Research Center Matsushita Electric Industrial Company Ltd.

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著作論文

New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns (Special Issue on Quarter Micron Si Device and Process Technologies)
Quarter Micron KrF Excimer Laser Lithography (Special Issue on Sub-Half Micron Si Device and Process Technologies)
A New Photobleachable Positive Resist for KrF Excimer Laser Lithography : Advanced III-V Compound Semiconductors and Silicon Devices(Solid State Devices and Materials 1)
A New Analytical Technique for Evaluating Standing Wave Effect of Chemically Amplified Positive Resist
Application of Photobleachable Positive Resist and contrast Enhancement Material to KrF Excimer Laser Lithography : Resist Material and Process
Novel Surface Reaction Model in Dry-Etching Process Simulator
Computer Aided Proximity Effect Correction System in Photolithography : Lithography Technology
Quantitative Evaluation of Gate Oxide Damage during Plasma Processing Using Antenna-Structure Capacitors
Lissajous Electron Plasma (LEP) Generation for Dry Etching
Submicron 3-Dimensional Structure Observation by Cyclotron SEM(Scanning Electron Microscope) : Inspection and Testing
Submicron 3-Dimensional Structure Observation by Cyclotron SEM(Scanning Electron Microscope)
A Novel High-Resolution Scanning Electron Microscope for the Surface Analysis of High-Aspect-Ratio Three-Dimensional Structures

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