Ogawa K | Department Of Advanced Materials Science Faculty Of Engineering Kagawa University

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著作論文

Growth of the 2223 Phase in Leaded Bi-Sr-Ca-Cu Oxide under Reduced Oxygen Partial Pressure
Growth of the 2223 Phase in Leaded Bi-Sr-Ca-Cu-O System : Electrical Properties of Condensed Matter
A New Mode of Modulation Observed in the Bi-Pb-Sr-Ca-Cu-O System : Electrical Properties of Condensed Matter
Transmission Electron Microscope Studies of Intergrowth in BiSrCaCu_2O_x and High-T_c Superconducting Phase : Electrical Properties of Condensed Matter
Effects of Oxygen-Potential-Controlled Annealing on the Superconducting Properties of (Bi, Pb)_2Sr_2Ca_2Cu_3O_y Thin Films
Control of Pre-Tilt Angles of Liquid Crystal Molecules Using a Chemically Adsorbed Monomolecular Layer as an Alignment Film in Liquid Crystal Cells
Applications of a Chemically Adsorbed Monomolecular Layer Having a Fluorocarbon Chain as an Anti-Contamination Film
A Liquid Crystal Display Having a Rubbing-Free Photo-Aligned Monomolecular Layer as an Alignment Film
Experiments on Discrimination between the Same Materials of Different Grain Size
Ocean Experiments to Discriminate Seabed Materials by Echo Pulse and Neural Network at Uchiura Bay
Effect of RF Bias on Low-Temperature Synthesis of Aluminium Nitride Film by Hollow Cathode Discharge-Type Ion Plating
Low-Temperature Synthesis of Aluminium Nitride Film by HCD-Type Ion Plating
Development of Actuators for Small-Size Magneto-Optical Disk Drives : Head Technology
Development of Actuators for Small-Size Magneto-Optical Disk Drives
Effects of Film Thickness and Annealing Conditions on 2223 Phase Growth in BSCCO Films Produced by Pb Vapor Doping
Formation of Thermally Stable Multilayered BSCCO Films with 2223, 2234 and 2245 Structures
Preparation of Multilayers by Alternate Cycles of Chemical Adsorption and Electron Beam Irradiation
Growth of the 2223 Phase in Bi-Sr-Ca-Cu Oxide Films under a Controlled Pb Potential
Synthesis of Artificially Layered Bi-Sr-Ca-Cu Oxide Films and Their Thermal Stability
A New Photobleachable Positive Resist for KrF Excimer Laser Lithography : Advanced III-V Compound Semiconductors and Silicon Devices(Solid State Devices and Materials 1)
A KrF Excimer Laser Lithography for Half Micron Devices : Techniques, Instrumentations and Measurement
New 3.5〃 Magneto-Optical Disk System:1.3GB GIGAMO : Technology, Design Concept and Reliability
Spectroscopic Evaluation on Photosensitive Langmuir Films Using Multichannel Spectrophotometer : Techniques, Instrumentations and Measurement

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