ENDO Masamori | Department of Physics, School of Science, Tokai University

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概要

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著作論文

化学酸素沃素レｰザｰ(Chemical Oxygen-Iodine Laser : COIL)の原子炉解体への応用
Performance Comparison of Real-Time Laser Absorption Spectrometers for NH_3 Detection at 1.54 and 3.03μm in a H_2O Vapor Mixture
Measurements of NO_2 Concentration with Wide Dynamic Range Based on Laser Absorption Spectroscopy Using a Multi-Pass Optical Cell : Effects of Ambient Temperature Change at the Optical Cell
Parametric Studies on Improved Laser Cutting Performance of Magnesium Alloy with Two Flow Nozzles
Trace Methane Detection Based on Raman Spectroscopy Using a High Finesse Optical Resonator
Performance Characteristics of Power Build-Up Cavity for Raman Spectroscopic Measurement
Sob-0.1-μm-Pattern Fabrication Using a 193-nm Top Surface Imaging (TSI) Process
Advanced Surface Modification Resist Process for ArF Lithography
New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns (Special Issue on Quarter Micron Si Device and Process Technologies)
Quarter Micron KrF Excimer Laser Lithography (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Removal of Water Vapor in a Mist Singlet Oxygen Generator for Chemical Oxygen Iodine Laser
Development of a Mist Singlet Oxygen Generator
霧化型励起酸素発生器の基礎研究III
Numerical Simulation of a Mist Singlet Oxygen Generator(Optics and Quantum Electronics)
霧化型励起酸素発生器の基礎研究II
霧化型励起酸素発生器の基礎研究
Two-Dimensional Simulation of and Experiments on the Forward-Backward Modes Coupled Unstable Resonator
Output Power Enhancement of a Chemical Oxygen-Iodine Laser by Predissociated Iodine Injection
化学酸素沃素レｰザｰ(Chemical Oxygen Iodine Laser : COIL)の高圧力動作
A New Photobleachable Positive Resist for KrF Excimer Laser Lithography : Advanced III-V Compound Semiconductors and Silicon Devices(Solid State Devices and Materials 1)
A KrF Excimer Laser Lithography for Half Micron Devices : Techniques, Instrumentations and Measurement
沃素のマイクロ波放電解離を用いた超音速化学酸素沃素レｰザ
Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193nm Lithography II : Protection Groups Containing an Adamantyl Unit
Timing Jitter Reduction in a Passively Mode-Locked Fiber Laser
Generation of Tunable Pulses below 345 fs Using a Passively Mode-Locked Fiber Ring Laser with Bulk Components
Waveform Shaping of a Chemical Oxygen-Iodine Laser Utilizing the Zeeman Effect
化学酸素沃素レｰザｰの磁場によるパルス発振
化学酸素沃素レーザの磁場による出力制御
Overlay Accuracy Measurement Technique Using the Latent Image on a Chemically Amplified Resist
Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength
Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer(Instrumentation, Measurement, and Fabrication Technology)
レーザーオリジナル Development of a Nitrogen Dioxide Gas Sensor Based on Mid-Infrared Absorption Spectroscopy
Cutting and Drilling of Inorganic Materials for Civil Engineering Using a Chemical Oxygen-Iodine Laser
Extension of the ArF Excimer Lithography to Sub-0.10/μm Design Rule Devices Using Bi-layer Silylation Process
Sub-0.10 μm Hole Fabrication Using Bilayer Silylation Process for 193 nm Lithography
Application of Photobleachable Positive Resist and contrast Enhancement Material to KrF Excimer Laser Lithography : Resist Material and Process
光力システムにおける窒素を用いた高効率超音速化学酸素沃素レーザー
光力システムにおける超音速化学励起沃素レーザーの新型 Jet type 励起酸素発生器の動作特性

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