Kawano T | Osaka Univ. Osaka Jpn
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概要
関連著者
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Kawano T
Osaka Univ. Osaka Jpn
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Kitano T
Tokyo Electron Kyushu Ltd. Kumamoto Jpn
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Kawano T
Tokyo Electron Kyushu Ltd. Kumamoto Jpn
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Kitano T
Fundamental Research Laboratories Nec Corporation
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TANIGAWA Shoichiro
Institute of Materials Science, The University of Tsukuba
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UEDONO Akira
Institute of Materials Science, University of Tsukuba
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Uedono A
Univ. Tsukuba Tsukuba Jpn
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KAWANO Takao
Radioisotope Center,University of Tsukuba
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Tanigawa Shoichiro
Institute Of Applied Physics University Of Tsukuba
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Kawano Takao
Radioisotope Center University Of Tsukuba
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Uedono Akira
Institute Of Applied Physics University Of Tsukuba
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Tanigawa S
Institute Of Applied Physics University Of Tsukuba
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Moriya T
Institute Of Material Science University Of Tsukuba
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MORIYA Tsuyoshi
Institute of Materials Science, University of Tsukuba
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Moriya Tsuyoshi
Institute Of Material Science University Of Tsukuba
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Moriya T
Tokyo Metropolitan University Graduate School Of Engineering
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MIKADO Tomohisa
National Institute of Advanced Industrial Science and Technology (AIST)
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TOYAMA Masaharu
Toshiba Research and Development Center
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Mikado T
Electrotechnical Laboratory
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Mikado Tomohisa
Institute Of Materials Science University Of Tsukuba
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MIKADO Tomohisa
Electrotechnical Laboratory
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Ohdaira Toshiyuki
National Institute Of Advanced Industrial Science And Technology
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Ohdaira Toshiyuki
Department Of Nuclear Engineering Kyoto University
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Kitano Tomohisa
Ulsi Device Development Laboratories Nec Corporation
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Mikado Tomohisa
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Ohshima Takeshi
Japan Atomic Energy Research Institute (jaeri)
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Ohdaira Toshiyuki
National Institute Of Advanced Industrial Science And Technology (aist)
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Ohgaki Takeshi
National Inst. For Materials Sci.
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Ohshima T
Japan Atomic Energy Res. Inst. Takasaki Jpn
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Ohgaki T
National Institute For Materials Science (nims)
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Takeda Shingo
Faculty Of Science Himeji Institute Of Technology
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SUZUKI Ryoichi
Electrotechnical Laboratory
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KAWANO Takanori
Department of Oral & Maxillofacial Prosthodontics and Oral Implantology, The University of Tokushima
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ENDO Masamori
Department of Physics, School of Science, Tokai University
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竹田 精治
大阪大学・大学院理学研究科
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Endo M
Department Of Physics School Of Science Tokai University
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Endo Masamori
Department Of Physics School Of Science Tokai University
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Suzuki R
National Institute Of Advanced Industrial Science And Technology
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FUJIOKA Tomoo
Department of Physics, School of Science, Tokai University
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Suzuki Ryoichi
National Institute Of Advanced Industrial Science And Technology
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OHDAIRA Toshiyuki
Electrotechnical Laboratory
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Fujioka Tomoo
Department Of Electrical Engineering Faculty Of Engineering Keio University
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Kawano Takanori
Department Of Electro-photo-optics School Of Engineering Tokai University
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Ikari Atsushi
Kimura Metamelt Project Erato Jrdc:(present Address) Advanced Technology Research Laboratories Nippo
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SUGIMOTO Daichi
Department of Physics, School of Science, Tokai University
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TAKEDA Shuzaburo
Department of Electro Photo Optics, Tokai University
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Okuno Y
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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KAWANO Toshihiro
Central Research Laboratory, Hitachi Ltd.
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Sugimoto Daichi
Institute For Applied Optics
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Okuno Y
Central Research Laboratory Hitachi Ltd.
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Kawano Toshihiro
Central Research Laboratory Hitachi Ltd.
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Uomi Kazuhisa
Central Research Laboratory, Hitachi Ltd.
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FUJII Satoshi
Itami Research Laboratories. Sumitomo Electric Industries, Ltd.
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Itoh H
Japan Atomic Energy Research Institute Takasaki Radiation Chemistry Research Establishment
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WEI Long
Institute of Materials Science, University of Tsukuba
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IKARI Atsushi
Electronics R & D Laboratories, Nippon Steel Corporation
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Kimura Y
Ntt Access Network Systems Laboratories Optical Soliton Transmission Research Group
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Ikari A
Wacker Nsce Corp. Yamaguchi Jpn
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Ikari Atsushi
R&d Group Wacker Nsce Corporation
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Tsuchiya T
Department Of Electronics Doshisha University
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Miura Y
Ntt Lsi Laboratories
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SHIMIZU Ryuichi
Department of Applied Physics, Osaka University
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Wei Long
Institute Of Materials Science University Of Tsukuba
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TSUCHIYA Tomonobu
Central Research Laboratory, Hitachi, Ltd.
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UOMI Kazuhisa
The author is with Optical Device Department, Telecommunications System Group, Hitachi Ltd.
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Fujii Syuitsu
Adtec Co. Ltd.
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KIMURA Yoshihide
Department of Applied Physics, Osaka University
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Ono Yuuichi
Central Research Laboratory, Hitachi, Ltd.
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OGURA Atsushi
Institute of Molecular and Cellular Biosciences, The University of Tokyo
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Ogura A
Nec Corp. Sagamihara Jpn
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Ogura A
Nec Corp. Kanagawa Jpn
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KAWAKAMI Kazuto
Electronics R & D Laboratories, Nippon Steel Corporation
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WANI Fumio
Opto Engineering Department, Kanto Technical Institute Laboratory, Kawasaki Heavy Industries
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Wani Fumio
Opto Engineering Department Kanto Technical Institute Laboratory Kawasaki Heavy Industries
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Tsuchiya Tomonobu
Central Research Laboratory Hitachi Ltd
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WATANABE Masahito
ULSI Device Development Laboratories, NEC Corporation
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KOMURO Naoyuki
Institute of Materials Science, University of Tsukuba
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Fujii Sadao
Central Research Laboratory Kanegafuchi Chemical Industry Co.
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Fujii S
Matsushita Electronics Corp. Kyoto Jpn
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TANIWATARI Tsuyoshi
Central Research Laboratory, Hitachi Ltd.
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WANI Fumio
Research Engineer Opto Engineering Department Kanto Technical Institute, Kawasaki Heavy Industries,
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KAWANO Takashi
Department of Applied Physics, Faculty of Engineering, Osaka University
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Ono Y
Opto-electronics Research Laboratories Nec Corporation
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Ono Y
Ntt Basic Res. Lab. Kanagawa Jpn
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Ono Yuuichi
Central Research Laboratory Hitachi Ltd.
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Uomi K
The Author Is With Optical Device Department Telecommunications System Group Hitachi Ltd.
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Uomi Kazuhisa
Central Research Laboratory Hitachi Ltd.
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Souda R
National Institute For Research In Inorganic Materials
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Fujioka T
Department Of Physics School Of Science Tokai University
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Hamada K
Ulsi Device Development Laboratories Nec Corporation
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Furuta Shigeru
Department Of Electric And Computer Engineering Nagoya Institute Of Technology
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Kitano T
Ulsi Device Development Laboratories Nec Corporation
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HAMADA Kouichi
ULSI Device Development Laboratories, NEC Corporation
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Shimizu R
Department Of Information Science Osaka Institute Of Technology
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Shimizu R
Osaka Univ. Osaka Jpn
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Shimizu Ryuichi
Department Of Applied Physics Faculty Of Engineering Osaka University
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Kimura Yoshihide
Department Of Applied Physics Faculty Of Engineering Osaka University
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Fujii S
Adtec Plasma Technol. Co. Ltd. Fukuyama Jpn
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Taniwatari T
Hitachi Ltd. Tokyo
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Taniwatari Tsuyoshi
Central Research Laboratory Hitachi Ltd.
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Kawano Takashi
Department Of Anesthesiology Tokushima University School Of Medicine
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Kojima Kenzo
Department Of Electrical Engineering Aichi Institute Of Technology
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伊藤 晴雄
千葉工業大学
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武藤 真三
山梨大学工学部
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SATOH Masaaki
Department of Clinical Pathology, School of Medicine, Sapporo Medical University
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ITOH Hisayoshi
Japan Atomic Energy Research Institute
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Suzuki Kenji
Department Of Cardiology Kyoto Second Red Cross Hospital
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NANRI Kenzo
Department of Physics, School of Science, Tokai University
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Nanri K
Department Of Physics School Of Science Tokai University
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Nanri Kenzo
Department Of Physics Faculty Of Science Tokai University
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Nanri Kenzo
Department Of Physics Tokai University
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KOBAYASHI Yosuke
Department of Electrical Engineering, Tokai University graduate school
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Muto Shigeki
Department Of Physics School Of Science Tokai University
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Kojima Kenzo
Department Of Electronic Engineering Faculty Of Engineering Aichi Institute Of Technology
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Itoh Hisayoshi
Japan Atomic Energy Agency
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Watanabe M
Hiroshima Univ. Higashi‐hiroshima Jpn
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OHSHIMA Takeshi
Japan Atomic Energy Research Institute
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Kuroda Kenji
Faculty Of Engineering The University Of Tokushima
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武藤 真三
山梨大学
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Aoki Yasushi
Japan Atomic Energy Research Institute
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Aoki Y
Department Of Materials Development Japan Atomic Energy Research Institute
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Ikari Atsushi
Advanced Technology Research Laboratories Nippon Steel Corporation
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Kojima Kenichi
Graduate School Of Integrated Science Yokohama City University
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Kojima Kenichi
Department Of Physics Yokohama City University
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Kojima Kenichi
Department Of Physics Faculty Of Sciences Tohoku University:faculty Of Integrated Arts And Sciences
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Suzuki Kenji
Department Of Physics School Of Science Tokai University
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Suzuki Kenji
Department Of Applied Physics Osaka University
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Wei L
Institute Of Materials Science University Of Tsukuba
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KAJIMURA Takashi
Central Research Laboratory. Hitachi Ltd.
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KAWAKAMI Kazuto
Advanced Technology Research Laboratories, Nippon Steel Corporation
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Aoki Yuji
Superconductivity Research Laboratory Istec
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MITSUHASHI Riichiro
Department of Applied Physics, Faculty of Engineering, Osaka University
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OKUMURA Hajime
Electrotechnical Laboratory (ETL)
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Watanabe Mahiko
Department Of Applied Physics And Chemistry Faculty Of Engineering Hiroshima University
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Kojima K
Department Of Electronic Engineering Faculty Of Engineering Aichi Institute Of Technology
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和田 健司
大阪府立大学 大学院工学研究科
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Wada K
Osaka Prefecture University
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Wada K
Hokkaido Univ. Sapporo Jpn
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Kuroda K
Central Research Laboratory Hitachi Ltd.
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Okumura H
National Institute Of Advanced Industrial Science And Technology Power Electronics Research Center
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Okumura H
Electrotechnical Lab. Ibaraki Jpn
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Okumura Hajime
Electrotechnical Laboratory
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Muto S
Kek Ibaraki
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Ogura Atsushi
Silicon Systems Research Laboratories Nec Corporation
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Wada Kazumi
NTT LSI Laboratories
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NAKANISHI Hideo
NTT LSI Laboratories
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TAKEKAWA Yoshinobu
Department of Physics, Tokai University
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YOSHIKAWA Masahito
Japan Atomic Energy Research Institute, Takasaki Radiation Chemistry Research Establishment
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NASHIYAMA Isamu
Japan Atomic Energy Research Institute
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YOSHIDA Sadafumi
Electrotechnical Laboratory
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ITOH Hisayoshi
Takasaki Radiation Chemistry Research Establishment, Japan Atomic Energy Research Institute
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SHIKATA Shinichi
Itami Research Laboratories, Sumitomo Electric Industries, Ltd.
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Kojima Kazuyoshi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Tachibana Masaru
Department Of Physics Yokohama City University
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Nakashima Keiichi
Central Research Labortory Hitachi Ltd.
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Yoshida Sadafumi
Division Of Mathematics Electronics And Informatics Graduate School Of Science And Engineering Saita
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Yoshikawa Masahito
Japan Atomic Energy Research Institute (jaeri)
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Yoshikawa Masahito
Japan Atomic Energy Research Institute
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HAMADA Kouji
ULSI Device Development Laboratories, NEC Corporation
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NAGAI Ryo
Semiconductor & Integrated Circuits Div., Hitachi, Ltd.
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UMEDA Kazunori
Central Research Laboratory, Hitachi, Ltd.
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ISHIBASHI Shoji
Electrotechnical Laboratory
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OKUNO Yae
Central Research Laboratory, Hitachi Ltd.,
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YOSHIZAWA Misuzu
Central Research Labortory, HITACHI, Ltd.
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OHISHI Akio
Central Research Labortory, HITACHI, Ltd.
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Ikari A
R&d Group Wacker Nsce Corporation
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Aoki Y
Advanced Technology Research Center Kanagawa Institute Of Technology
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TAKEDA Shusaburo
Department of Electro Photo Optics, School of Engineering, Tokai University
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SHIMIZU Mikio
Department of Physics, Yokohama City University
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HAGA Hiroyo
Electronics Research Laboratories, Nippon Steel Corporation
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KAWANO Takao
Isotope Center, University of Tsukuba
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Nagata Ken
Department Of Nuclear Energy School Of Engineering Tokai University
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Ohishi Akio
Central Research Labortory Hitachi Ltd.
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Haga Hiroyo
Electronics Research Laboratories Nippon Steel Corporation
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Hamada Kouji
Ulsi Device Development Laboratories Nec Corporation
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Komuro Naoyuki
Institute Of Materials Science University Of Tsukuba
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Miura Yoshinao
Silicon Systems Research Laboratories System Devices And Fundamental Research Nec Corporation
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Okunuma H
National Institute Of Advanced Industrial Science And Technology
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MIURA Yoshinao
Microelectronics Research Laboratories, NEC Corporation
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OGURA Atsushi
Microelectronics Research Laboratories, NEC Corporation
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Nakanishi H
Tohoku Univ. Sendai Jpn
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Umeda Kazunori
Central Research Laboratory Hitachi Ltd.
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Shikata Shinichi
Itami Research Laboratories Sumitomo Electric Industries Ltd.
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Nashiyama I
Japan Atomic Energy Research Institute
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Ogura Atsushi
Silicon Systems Research Laboratories Nec Corp.
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Ogura Atsushi
Microelectronics Research Laboratories Nec Corporation
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Shimizu M
Department Of Physics Yokohama City University
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Ishibashi S
Electrotechnical Laboratory
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Yoshizawa Misuzu
Central Research Labortory Hitachi Ltd.
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Mitsuhashi Riichiro
Department Of Applied Physics Faculty Of Engineering Osaka University
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Nakanishi H
Department Of Electrical Engineering Science University Of Tokyo
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Okuno Yae
Central Research Laboratory Hitachi Ltd.
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Muto Shinzo
Department Of Electrical Engineering And Computer Science Faculty Of Engineering Yamanashi Universit
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KURODA Keigo
Department of Materials Science, Faculty of Science, Hiroshima University
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Kojima Kenichi
Department Of Hematology Ogikubo Hospital
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Kawakami K
Nippon Steel Corp. Kanagawa Jpn
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Kawakami Kazuto
Electronics Research Laboratories Nippon Steel Corporation
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武藤 俊介
名古屋大学
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Kajimura Takashi
Central Research Laboratory Hitachi Ltd.
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Kajimura Takashi
Central Research Labortory Hitachi Ltd.
著作論文
- 霧化型励起酸素発生器の基礎研究
- Defects in Ion-Implanted 3C-SiC Probed by a Monoenergetic Positron Beam
- Oxygen Microclusters in Czochralski-Grown Si Probed by Positron Annihilation
- Annealing Properties of Defects in B^+- and F^+-Implanted Si Studied Using Monoenergetic Positron Beams
- Fluorine-Related Defects in BF^+_2-Implanted Si Probed by Monoenergetic Positron Beams
- Positron Annihilation in Germanium in Thermal Equilibrium at High Temperature
- Effects of Recoil-Implanted Oxygen on Depth Profiles of Defects and Annealing Processes in P^+-Implanted Si Studied Using Monoenergetic Positron Beams
- Formation of Oxygen-Related Defects Enhanced by Fluorine in BF^+_2-Implanted Si Studied by a Monoenergetic Positron Beam
- Characterization of Metal/GaAs Interfaces by Monoenergetic Positron Beam
- Vacancy-Type Defects in Ion-Implanted Diamonds Probed by Monoenergetic Positron Beams
- In Situ X-Ray Monitoring of Metalorganic Vapor Phase Epitaxy
- Threading Dislocation Reduction in InP on GaAs by Thin Strained Interlayer and its Application to the Fabrication of 1.3-μm-Wavelength Laser on GaAs
- Improved Self-Aligned Structure for GaAlAs High-Power Lasers
- Waveform Shaping of a Chemical Oxygen-Iodine Laser Utilizing the Zeeman Effect
- 化学酸素沃素レｰザｰの磁場によるパルス発振
- Study on Zr-Si/W(100) Surface at High Temperatures by Reflection High Energy Electron Diffraction
- 化学酸素沃素レーザの磁場による出力制御
- Study on Zr-Si/W(100) Surface at High Temperatures by Combined Surface Analysis Techniques
- Thermal Equilibrium Defects in Anthracene Probed by Positron Annihilation
- Defects in Czochralski-Grown Silicon Crystals Investigated by Positron Annihilation
- Defects Introduced by Ar Plasma Exposure in GaAs Probed by Monoenergetic Positron Beam
- Evaluation of Electron Trap Levels in SOI Buried Oxides by Transient Photocurrent Spectroscopy
- Evaluation of Electron Trap Levels in SIMOX Buried Oxide by Transient Photocurrent Spectroscopy