Evaluation of Electron Trap Levels in SIMOX Buried Oxide by Transient Photocurrent Spectroscopy

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概要

• 論文の詳細を見る
• 1997-09-16

著者

• Kitano T

  Tokyo Electron Kyushu Ltd. Kumamoto Jpn

• Miura Y

  Ntt Lsi Laboratories

• Kawano T

  Osaka Univ. Osaka Jpn

• OGURA Atsushi

  Institute of Molecular and Cellular Biosciences, The University of Tokyo

• Ogura A

  Nec Corp. Sagamihara Jpn

• Ogura A

  Nec Corp. Kanagawa Jpn

• Kawano T

  Tokyo Electron Kyushu Ltd. Kumamoto Jpn

• Kitano T

  Fundamental Research Laboratories Nec Corporation

• Kitano Tomohisa

  Ulsi Device Development Laboratories Nec Corporation

• Hamada K

  Ulsi Device Development Laboratories Nec Corporation

• Kitano T

  Ulsi Device Development Laboratories Nec Corporation

• HAMADA Kouichi

  ULSI Device Development Laboratories, NEC Corporation

• MIURA Yoshinao

  Microelectronics Research Laboratories, NEC Corporation

• OGURA Atsushi

  Microelectronics Research Laboratories, NEC Corporation

• Ogura Atsushi

  Microelectronics Research Laboratories Nec Corporation

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