Thinning of SOI Bonded Wafers by Applying Voltage during KOH Etching

スポンサーリンク

概要

• 論文の詳細を見る
• 1996-08-26

著者

• OGURA Atsushi

  Microelectronics Research Laboratories, NEC Corporation

• Ogura Atsushi

  Microelectronics Research Laboratories Nec Corporation

関連論文

• Evaluation of Electron Trap Levels in SIMOX Buried Oxide by Transient Photocurrent Spectroscopy
• Nonseeded Crystalline Orientation Control for Si-on-Insulator Laser Recrystallization
• Precise Measurement of Strain in SOI Induced by Local Oxidation
• Thinning of SOI Bonded Wafers by Applying Voltage during KOH Etching

スポンサーリンク