In Situ X-Ray Monitoring of Metalorganic Vapor Phase Epitaxy

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-10-15

著者

• Uomi Kazuhisa

  Central Research Laboratory, Hitachi Ltd.

• Kitano T

  Tokyo Electron Kyushu Ltd. Kumamoto Jpn

• Tsuchiya T

  Department Of Electronics Doshisha University

• Kawano T

  Osaka Univ. Osaka Jpn

• TSUCHIYA Tomonobu

  Central Research Laboratory, Hitachi, Ltd.

• UOMI Kazuhisa

  The author is with Optical Device Department, Telecommunications System Group, Hitachi Ltd.

• Ono Yuuichi

  Central Research Laboratory, Hitachi, Ltd.

• Kawano T

  Tokyo Electron Kyushu Ltd. Kumamoto Jpn

• Kitano T

  Fundamental Research Laboratories Nec Corporation

• Tsuchiya Tomonobu

  Central Research Laboratory Hitachi Ltd

• Okuno Y

  Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology

• TANIWATARI Tsuyoshi

  Central Research Laboratory, Hitachi Ltd.

• KAWANO Toshihiro

  Central Research Laboratory, Hitachi Ltd.

• Ono Y

  Opto-electronics Research Laboratories Nec Corporation

• Ono Y

  Ntt Basic Res. Lab. Kanagawa Jpn

• Ono Yuuichi

  Central Research Laboratory Hitachi Ltd.

• Uomi K

  The Author Is With Optical Device Department Telecommunications System Group Hitachi Ltd.

• Uomi Kazuhisa

  Central Research Laboratory Hitachi Ltd.

• Okuno Y

  Central Research Laboratory Hitachi Ltd.

• Kawano Toshihiro

  Central Research Laboratory Hitachi Ltd.

• Taniwatari T

  Hitachi Ltd. Tokyo

• Taniwatari Tsuyoshi

  Central Research Laboratory Hitachi Ltd.

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