Okuno Y | Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
スポンサーリンク
概要
- 奥野 泰利の詳細を見る
- 同名の論文著者
- Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology の論文著者
関連著者
-
Okuno Y
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
-
Okuno Yasutoshi
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
-
奥野 泰利
日本テキサスインスツルメンツ(株)、ulsi技術開発センター
-
Okuno Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp., 19, Nishikujo-kasuga cho, Minami-ku, Kyoto 601-8413, Japan
-
奥野 泰利
松下電器産業(株)
-
Mori Yoshihiro
Ulsi Process Technology Development Center Matsushita Electronics Corporation
-
Mori Yoshihiro
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.
-
TSUZUMITANI Akihiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
-
OKUNO Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.
-
Okuno Y
Central Research Laboratory Hitachi Ltd.
-
Uomi Kazuhisa
Central Research Laboratory, Hitachi Ltd.
-
Mori Y
Research Center For Ultra-precision Science And Technology Graduate School Of Engineering Osaka Univ
-
Mori Yusuke
Graduate School of Engineering, Osaka University
-
OHTSU Yasunori
Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Sag
-
Kitano T
Tokyo Electron Kyushu Ltd. Kumamoto Jpn
-
Kawano T
Osaka Univ. Osaka Jpn
-
TSUCHIYA Tomonobu
Central Research Laboratory, Hitachi, Ltd.
-
UOMI Kazuhisa
The author is with Optical Device Department, Telecommunications System Group, Hitachi Ltd.
-
Mori Y
Osaka Univ. Suita Jpn
-
FUJITA Hiroharu
Department of Electrical and Electronic Engineering, Saga University
-
Kawano T
Tokyo Electron Kyushu Ltd. Kumamoto Jpn
-
OKUNO Yoshihiro
Department of Energy Sciences, Tokyo Institute of Technology
-
Kitano T
Fundamental Research Laboratories Nec Corporation
-
Tsuchiya Tomonobu
Central Research Laboratory Hitachi Ltd
-
KAWANO Toshihiro
Central Research Laboratory, Hitachi Ltd.
-
Uomi K
The Author Is With Optical Device Department Telecommunications System Group Hitachi Ltd.
-
Uomi Kazuhisa
Central Research Laboratory Hitachi Ltd.
-
Kawano Toshihiro
Central Research Laboratory Hitachi Ltd.
-
Tsuzumitani Akihiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
-
Tsuzumitani Akihiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
-
Mori Yuzo
Department Of Mechanical Engineering Kochi National College Of Technology
-
Yamamoto K
Kobayasi Institute Of Physical Research
-
Tsuchiya T
Department Of Electronics Doshisha University
-
Shibata J
Japan Fine Ceramic Center Nagoya Jpn
-
ASAHI Hajime
The Institute of Scientific and Industrial Research, Osaka University
-
GONDA Shun-ichi
The Institute of Scientific and Industrial Research, Osaka University
-
OGAWA Hisashi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.
-
SHIBATA Jun
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
-
SHIMIZU Tadami
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
-
YAMAMOTO Kazuhiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
-
Ono Yuuichi
Central Research Laboratory, Hitachi, Ltd.
-
Shimizu T
Univ. Occupational And Environmental Health Jpn
-
Shimizu Tadao
Department Of Physics University Of Tokyo
-
Shimizu T
Department Of Electrical And Electronic Engineering Kanazawa University
-
Yamamoto K
Storage Media Systems Development Center Matsushita Elec. Ind. Co. Ltd.
-
TANIWATARI Tsuyoshi
Central Research Laboratory, Hitachi Ltd.
-
OKUNO Yasutoshi
The Institute of Scientific and Industrial Research, Osaka University
-
OKUNO Yae
Central Research Laboratory, Hitachi Ltd.,
-
Shimizu T
Faculty Of Engineering Chiba University
-
Ono Y
Opto-electronics Research Laboratories Nec Corporation
-
Ono Y
Ntt Basic Res. Lab. Kanagawa Jpn
-
Ono Yuuichi
Central Research Laboratory Hitachi Ltd.
-
Asahi H
Osaka Univ. Osaka Jpn
-
Asahi Hajime
The Institute Of Scientific And Industrial Research Osaha University
-
Gonda S
The Institute Of Scientific And Industrial Research Osaka University
-
Shimizu T
Chiba Univ. Chiba Jpn
-
Gonda Shun-ichi
The Institute Of Scientific And Industrial Research Osaka University
-
Okuno Yae
Central Research Laboratory Hitachi Ltd.
-
Taniwatari T
Hitachi Ltd. Tokyo
-
Taniwatari Tsuyoshi
Central Research Laboratory Hitachi Ltd.
-
Shibata Jun
Ulsi Process Technology Development Center Matsushita Electronics Corporation
-
Yamamoto Kazuhiko
ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd., 19 Nishikujo-Kasugacho, Minami-ku, Kyoto 601-8413, Japan
-
Yamamoto Kazuhiko
ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.
-
朝日 一
大阪大学産業科学研究所
-
権田 俊一
大阪大学産業科学研究所
-
AOKI Masahiro
Central Research Laboratory, Hitachi, Ltd.
-
Fukuda Y
Texas Instruments Tsukuba Res. And Dev. Center Ltd. Ibaraki Jpn
-
Fukuda Y
Department Of Physics Faculty Of Science Kobe University
-
福田 幸夫
(株)テキサスインスツルメンツ筑波研究開発センター
-
Fukuda Yukio
Texas Instruments Tukuba Research & Development Center Limited
-
KAJIMURA Takashi
Central Research Laboratory. Hitachi Ltd.
-
Kakimi A
Texas Instruments Tsukuba Res. And Dev. Center Ltd. Ibaraki Jpn
-
TSUNEMINE Yoshikazu
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
-
OKUDAIRA Tomonori
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
-
KASHIHARA Keiichiro
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
-
YUTANI Akie
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
-
SHINKAWATA Hiroki
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
-
MAZUMDER Motaharul
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
-
OHNO Yoshikazu
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
-
YONEDA Masahiro
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
-
DORNFEST Charles
Applied Materials
-
JIN Xiaoliang
Applied Materials
-
KHER Shreyas
Applied Materials
-
TAO Jerry
Applied Materials
-
WANG Yaxin
Applied Materials
-
ZHAO Jun
Applied Materials
-
MIYAKE Shoji
Welding Research Institute of Osaka Univ.,
-
Yutani Akie
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
-
青木 克裕
(株)テキサスインスツルメンツ筑波研究開発センター
-
Okuno Yoshihiro
Department Of Energy Sciences Interdisciplinary Graduate School Of Science And Engineering Tokyo Ins
-
AOKI Katsuhiro
Texas Instruments Tsukuba Research and Development Center, Limited
-
Tsuchiya Tomonobu
Nagoya University
-
Nakashima Keiichi
Central Research Labortory Hitachi Ltd.
-
Shinkawata Hiroki
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
-
Mazumder Motaharul
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
-
森 義弘
松下電器産業(株)
-
森 義弘
松下電器産業
-
OKUNO Yoshihiro
Welding Research Institute, Osaka University
-
OHTSU Yasunori
Welding Research Institute, Osaka University
-
FUJITA Hiroharu
Welding Research Institute, Osaka University
-
CHEN Wei
Welding Research Institute, Osaka University
-
KANEKO Tadaaki
The Institute of Scientific and Industrial Research, Osaka University
-
LIU Xuefeng
The Institute of Scientific and Industrial Research, Osaka University
-
INOUE Keishi
The Institute of Scientific and Industrial Research, Osaka University
-
YAGURA Shinya
Department of Electronic Control Engineering, Niihama National College of Technology
-
YOSHIZAWA Misuzu
Central Research Labortory, HITACHI, Ltd.
-
OHISHI Akio
Central Research Labortory, HITACHI, Ltd.
-
Numata K
The Authors Are With Memory Research & Development Center Texas Instruments Inc.
-
沼田 乾
日本テキサスインスツルメンツ(株)、ulsi技術開発センター
-
Ohishi Akio
Central Research Labortory Hitachi Ltd.
-
Liu X
Shanghai Inst. Technical Physics Of Chinese Acad. Sci. Shanghai Chn
-
Inoue Keishi
The Institute Of Scientific And Industrial Research Osaka University
-
Yagura S
Department Of Electronic Control Engineering Niihama National College Of Technology
-
Yagura Shinya
Department Of Electrical Engineering Saga University
-
Ogawa Hisashi
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.
-
Kaneko Tadaaki
The Institute Of Scientific And Industrial Research Osaka University
-
Ohtsu Yasunori
Department Of Electrical & Electronic Engineering Saga University
-
Aoki Katsuhiro
Texas Instruments Tsukuba Research & Development Center Limited
-
Shimizu Tatsuo
Faculty Of Technology
-
Nishimura Akitoshi
The Authors Are With Memory Research & Development Center Texas Instruments Inc.
-
西村 明俊
日本テキサスインスツルメンツ(株)、ulsi技術開発センター
-
NUMATA Ken
Texas Instruments Japan, ULSI Technology Center
-
OKUNO Yasutoshi
Texas Instruments Japan, ULSI Technology Center
-
NISHIMURA Akitoshi
Texas Instruments Japan, ULSI Technology Center
-
Fujita Hiroharu
Department Of Electrical And Electronic Engineering Saga University
-
Miyake Shoji
Welding Research Institute Of Osaka Univ.
-
Yoshizawa Misuzu
Central Research Labortory Hitachi Ltd.
-
Fukuda Yukio
Texas Instruments Tsukuba Research & Development Center Limited
-
福田 幸夫
日本テキサスインスツルメンツ(株)、ULSI技術開発センター
-
青木 克裕
日本テキサスインスツルメンツ(株)、ULSI技術開発センター
-
皷谷 昭彦
松下電器産業(株)
-
小川 久
松下電器産業(株)
-
Aoki Masahiro
Central Research Laboratory Hitachi Ltd.
-
Ogawa Hisashi
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
-
Shimizu Tadao
Department Of Industrial Chemistry Chiba Institute Of Technology
-
Shimizu Tadao
Department Of Physics Faculty Of Science The University Of Tokyo
-
Fujita Hiroharu
Department Of Electrical & Electronic Engineering Saga University
-
Kajimura Takashi
Central Research Laboratory Hitachi Ltd.
-
Kajimura Takashi
Central Research Labortory Hitachi Ltd.
-
皷谷 昭彦
松下電器産業
-
Chen Wei
Welding Research Institute Osaka University
-
奥野 泰利
大阪大学産業科学研究所
-
金子 忠昭
大阪大学産業科学研究所
-
井谷 康志
大阪大学産業科学研究所
-
TSUCHIYA Tomonobu
Central Research Laboratory, Hitachi Ltd.,
著作論文
- Pt/Ba_xSr_TiO_3/Pt Capacitor Technology for 0.15μm Embedded Dynamic Random Access Memory
- Low Temperature BST-CVD Process for the Concave-Type Capacitors Designed for Logic-Base-Embedded DRAMs
- Extendibility of Ta_2O_5 Metal-Insulator-Metal Capacitor Using Ru Electrode
- Ru-Ta_2O_5MIM Capacitor toward 0.1μm DRAM Cell
- Measurement of Ion Temperature in Electron Cyclotron Resonance Plasma
- In Situ X-Ray Monitoring of Metalorganic Vapor Phase Epitaxy
- Effect of RF-Biased Electrode on Microwave Plasma
- Improved Growth Kinetic Model for Metalorganic Molecular Beam Epitaxy Using Triethylgallium
- Selective Area Epitaxy of GaSb by Metal-Organic Molecular Beam Epitaxy
- Threading Dislocation Reduction in InP on GaAs by Thin Strained Interlayer and its Application to the Fabrication of 1.3-μm-Wavelength Laser on GaAs
- Measurement of Electron Energy Distribution Function in a Low-Pressure rf Discharge Plasma
- Modulation of Electron Velocity Distribution Function by Moving Cathode Sheath in a Low-Pressure rf Discharge
- Improved Self-Aligned Structure for GaAlAs High-Power Lasers
- Direct Wafer Bonding Technique Aiming for Free-Material and Free-Orientation Integration of Semiconductor Materials
- Influence of the Relaxation Current in Ba_xSr_lt(1-x)gtTiO_3 Thin Film Capacitors on DRAM Operation
- セルキャパシター誘電体としてのBa_xSr_TiO_3が有する21世紀のDRAMに対する影響 : DRAMセルキャパシター構造の簡略化を指向した高誘電体薄膜の開発
- 混載DRAM用低温BST-CVDキャパシタ開発
- MOMBE法によるAIGaSbの成長