Asahi Hajime | The Institute Of Scientific And Industrial Research Osaha University
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概要
関連著者
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Asahi Hajime
The Institute Of Scientific And Industrial Research Osaha University
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ASAHI Hajime
The Institute of Scientific and Industrial Research, Osaka University
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Asahi H
Osaka Univ. Osaka Jpn
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Gonda Shun-ichi
The Institute Of Scientific And Industrial Research Osaka University
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Gonda S
The Institute Of Scientific And Industrial Research Osaka University
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GONDA Shun-ichi
The Institute of Scientific and Industrial Research, Osaka University
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ASAMI Kumiko
The Institute of Scientific and Industrial Research, Osaka University
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Asami Kumiko
The Institute Of Scientific And Industrial Research Osaha University
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Asami K
The Institute Of Scientific And Industrial Research Osaka University
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Gonda Satoshi
National Metrology Institute Of Japan National Institute Of Advanced Industrial Science And Technolo
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Hasegawa Shigehiko
The Institute Of Scientific And Industrial Research Osaka University
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Kim S‐j
Pohang Univ. Sci. And Technol. Kyungbuk Kor
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Kim Seong-jin
Division Of Electronics And Information Technology Kist
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NOH Joo-Hyong
Yokogawa Electric Corporation
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KIM Seong-Jin
The Institute of Scientific and Industrial Research, Osaka University
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NOH Joo-Hyong
The Institute of Scientific and Industrial Research, Osaka University
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Noh J‐h
Yokohama National Univ. Yokohama Jpn
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Kim Seong-jin
The Institute Of Scientific And Industrial Research Osaka University:(present Address) Electrotechni
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Noh Joo-hyong
The Institute Of Scientific And Industrial Research Osaka University
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Kim S‐j
National Institute For Material Science (nims):new Industry Creation Hatchery Center (niche) Tohoka
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Fudeta Mayuko
The Institute Of Scientific And Industrial Research Osaka University
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FUDETA Mayuko
The Institute of Scientific and Industrial Research, Osaka University
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IWATA Kakuya
The Institute of Scientific and Industrial Research, Osaka University
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Iwata K
Optoelectronic Materials And Devices Group Photonics Research Institute National Institute Of Advanc
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Mori Jun
The Institute Of Scientific And Industrial Research Osaka University
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Mori Jun
Department Of Pharmaceutical Research Lead Chemical Co. Ltd.
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WATANABE Daisuke
The Institute of Scientific and Industrial Research, Osaka University
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YAMAMOTO Kazuhiko
The Institute of Scientific and Industrial Research, Osaka University
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Zhou Yi
The Institute Of Scientific And Industrial Research Osaha University
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Watanabe D
Department Of Gastroenterology Akita University School Of Medicine
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Watanabe Daisuke
The Institute Of Scientific And Industrial Research Osaka University
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OE Kunishige
NTT Opto-electronics Laboratories
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Oe Kunishige
Ntt Opto Electronics Laboratories:(present Address)kyoto Institute Of Technology
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TAKEMOTO Minori
The Institute of Scientific and Industrial Research, Osaka Unversity
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KUROIWA Reiko
The Institute of Scientific and Industrial Research, Osaka University
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Yamamoto K
Univ. Of Tsukuba
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Emura Shuichi
The Institute Of Scientific And Industrial Research Osaka University
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Kuroiwa Reiko
The Institute Of Scientific And Industrial Research Osaka University
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Yamamoto K
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Yamamoto K
Saga Univ. Saga Jpn
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Kim Moo
The Institute Of Scientific And Industrial Research Osaka University
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Kim Joon
The Institute Of Scientific And Industrial Research Osaka University
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Lee Hwack-joo
New Materials Evaluation Center Korea Research Institute Of Standards And Science
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Matsuda Satoru
The Institute Of Scientific And Industrial Research Osaka University
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Kim Jae
Photonics Research Center Korea Institute Of Science And Technology
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Matsuda S‐p
Hitachi Research Laboratory Hitachi Ltd.
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Matsuda Shimpei
Hitachi Research Laboratory Of Hitachi Ltd.
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Okuno Yasutoshi
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Hidaka Ken-ichi
The Institute Of Scientific And Industrial Research Osaka University
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MORI Jun
School of Science, Kwansei-Gakuin University
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EMURA Shuichi
The Institute of Scientific and Industrial Research, Osaka University
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DOI Kenji
The Institute of Scientific and Industrial Research, Osaka University
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Matsuda Seisuke
Faculty Of Technology Tokyo Universily Of Agriculture And Technology:(present Address) Olympus Optic
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Kim Ji
Department Of Materials Engineering Sungkyunkwan University
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FUSHIDA Masahiro
The Institute of Scientific and Industrial Research, Osaka University
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KOH Hideki
The Institute of Scientific and Industrial Research, Osaka University
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Okuno Y
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Doi K
The Institute Of Scientific And Industrial Research Osaka University
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Doi K
Kyushu Kyoritsu Univ. Fukuoka Jpn
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OKUNO Yasutoshi
The Institute of Scientific and Industrial Research, Osaka University
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Kim J
Photonics Research Center Korea Institute Of Science And Technology
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Hashimoto Masahiko
The Institute Of Scientific And Industrial Research Osaka University
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Maeda Osamu
Department Of Urology Osaka Medical Center For Cancer And Cardiovascular Diseases
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Maeda Osamu
The Institute Of Scientific And Industrial Research Osaha University
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Maeda Osamu
Department Of Chemical Pharmacology Toho University School Of Pharmaceutical Sciences
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Asahi Hajime
The Institute Of Scientific And Industrial Research Osaka University
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Asami K
The Institute Of Scientific And Industrial Research Osaha University
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SHIMADA Takashi
The Institute of Scientific and Industrial Research, Osaka University
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Maeda O
Yamaha Motor Advanced Technology Research Div.
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Mukai Toshikazu
The Institute Of Scientific And Industrial Research Osaka University
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奥野 泰利
日本テキサスインスツルメンツ(株)、ulsi技術開発センター
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奥野 泰利
松下電器産業(株)
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LEE Hui-Jae
The Institute of Scientific and Industrial Research, Osaka University
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KONISHI Kenta
The Institute of Scientific and Industrial Research, Osaka University
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MIZOBATA Akiko
The Institute of Scientific and Industrial Research, Osaka University
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Kim J
Photonic Research Center Korea Institute Of Science And Technology
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HAYASHI Toshihiko
The Institute of Scientific and Industrial Research, Osaka University
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Konishi K
The Institute Of Scientific And Industrial Research Osaha University
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Mizobata Akiko
The Institute Of Scientific And Industrial Research Osaha University
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Fujiwara Atsushi
The Institute Of Scientific And Industrial Research Osaka University
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Matsumoto Takeshi
The Institute Of Scientific And Industrial Research Osaka University
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Fushida Masahiro
The Institute Of Scientific And Industrial Research Osaka University
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Kimura Shigeya
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Subashchandran Shanthi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Kobayashi Satoru
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Okuno Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp., 19, Nishikujo-kasuga cho, Minami-ku, Kyoto 601-8413, Japan
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Konishi Kenta
The Institute of Scientific and Industrial Research, Osaha University
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Uenaka Mai
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Seo Jong
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Kimura Mariko
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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HARIMA Hiroshi
Department of Electronics and Information Science, Kyoto Institute of Technology
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KAWAKAMI Yoichi
Department of Electrical Engineering Kyoto University
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TANAKA Hiroyuki
The Institute of Scientific and Industrial Research, Osaka University
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Sumida Hitoshi
The Institute Of Scientific And Industrial Research Osaka University
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GONDA Shunn-ichi
The Institute of Scientific and Industrial Research, Osaka Unversity
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TAKEUCHI Misaichi
The Institute of Scientific and Industrial Research, Osaka University
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NAKAJIMA MAKOTO
Department of Forensic Medicine, Graduate School of Medicine, The University of Tokyo
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Tampo H
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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NARUKAWA Yukio
Department of Electronic Science and Engineering, Kyoto University
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FUJITA Sigeo
Department of Electronic Science and Engineering, Kyoto University
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MORI Jun
Kwansei-Gakuin University
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WATANABE Hiromichi
The Institute of Scientific and Industrial Research, Osaka University
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Fujita Sigeo
Department Of Electronic Science And Engineering Kyoto University
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Narukawa Yukio
Department Of Electronic Science And Engineering Kyoto University
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YU Soon
The Institute of Scientific and Industrial Research, Osaka University
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KOMURO Masanori
Electrotechnical Laboratory
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Kawakami Yoichi
Department Of Electronic Science And Engineering Kyoto University
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Kawakami Yoichi
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Hayashi Toshihiko
Faculty Of Pharmaceutical Sciences Teikyo Heisei University
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Okumura Shigekazu
The Institute Of Scientific And Industrial Research Osaha University
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Akimoto Katsuhiro
Institute Of Applied Physics University Of Tsukuba
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Yamanaka Takayuki
The Institute Of Scientific And Industrial Research Osaka University
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Watanabe Hiromichi
The Institute Of Scientific And Industrial Research Osaka University
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YANASE Akira
The Institute of Scientific and Industrial Research, Osaka University
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Yamamoto K
Kaneka Corporation
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KANEKO Tadaaki
The Institute of Scientific and Industrial Research, Osaka University
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LIU Xuefeng
The Institute of Scientific and Industrial Research, Osaka University
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INOUE Keishi
The Institute of Scientific and Industrial Research, Osaka University
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Takenaka K
Kyushu Univ. Fukuoka Jpn
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Yu S
Department Of Electronics Engineering Sun Moon University
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Yu Soon
The Institute Of Scientific And Industrial Research Osaka University
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Yu Soon
Department Of Electronics Engineering And Center For Science And Advanced Technology Sun Moon Univer
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Zhou Yi
The Institute Of Scientific And Industrial Research Osaka University
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Liu X
Shanghai Inst. Technical Physics Of Chinese Acad. Sci. Shanghai Chn
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Inoue Keishi
The Institute Of Scientific And Industrial Research Osaka University
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Kaneko Tadaaki
The Institute Of Scientific And Industrial Research Osaka University
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Harima Hiroshi
Department Of Applied Physics Osaha University
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KANAMURA Masahito
The Institute of Scientific and Industrial Research, Osaha University
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Takeuchi Misaichi
The Institute Of Physical And Chemical Research(riken)
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Takeuchi Misaichi
The Institute Of Scientific And Industrial Research Osaka University
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Hayashi T
Faculty Of Pharmaceutical Sciences Teikyo Heisei University
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Fujita Hideki
Nissin Electric Co. Ltd
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Nakano Tomonori
The Institute Of Scientific And Industrial Research Osaka University
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MATSUDA Satoshi
The Institute of Scientific and Industrial Research, Osaka University
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TAMPO Hitoshi
The Institute of Scientific and industrial Research, Osaka University
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YAMADA Kohichiro
The Institute of Scientific and industrial Research, Osaka University
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OHNISHI Kuniyuki
The Institute of Scientific and industrial Research, Osaka University
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CONDA Shun-ichi
The Institute of Scientific and Industrial Research, Osaka University
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Koh H
The Institute Of Scientific And Industrial Research Osaka University
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Tampo Hitoshi
The Institute Of Scientific And Industrial Research Osaka University
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TAKENAKA Keiichi
The Institute of Scientific and Industrial Research, Osaka University
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Ohnishi Kuniyuki
The Institute Of Scientific And Industrial Research Osaka University
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Yamada Kohichiro
The Institute Of Scientific And Industrial Research Osaka University
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Kanamura Masahito
The Institute Of Scientific And Industrial Research Osaha University
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Ishimaru Manabu
The Institute Of Scientific And Industrial Research Osaka University
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ASANO Ryo
The Institute of Scientific and Industrial Research, Osaka University
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BANG Hyungjin
Institute of Applied Physics, University of Tsukuba
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FUJIWARA Atsushi
The Institute of Scientific and Industrial Research, Osaka University
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MATSUMOTO Takeshi
The Institute of Scientific and Industrial Research, Osaka University
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Nakajima Makoto
Department Of Applied Physics Osaha University
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Asano Ryo
The Institute Of Scientific And Industrial Research Osaka University
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Bang Hyungjin
Institute Of Applied Physics University Of Tsukuba
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KIM Moo
The Institute of Scientific and Industrial Research, Osaka University
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Conda Shun-ichi
The Institute Of Scientific And Industrial Research Osaka University
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Hayashi Toshihiko
Teikyo Heisei University
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Tanaka Hiroyuki
The Institute Of Science And Industrial Research (isir-sanken) Osaka University:jst Presto
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Hirotsu Yoshihiko
The Institute Of Science And Industrial Research Osaka University
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Kim Jooh
The Institute of Scientific and Industrial Research, Osaka University
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Yanase Akira
The Institute Of Scientific And Industrial Research Osaka University
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Kuchiyama Takashi
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Zhou Yi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Yamamoto Kenji
Photovoltaic and Thin Film Device Research Laboratories, Kaneka Corporation, Settsu, Osaka 566-0072, Japan
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Teraoka Yuden
Surface Chemistry Research Group, Synchrotron Radiation Research Center, Quantum Beam Science Directorate, Japan Atomic Energy Agency, Sayo, Hyogo 679-5198, Japan
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Hirotsu Yoshihiko
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Yabuuchi Atsushi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Doi Wataru
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Asahi Hajime
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Asahi Hajime
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Hasegawa Shigehiko
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Emura Shuichi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Ishimaru Manabu
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Nakano Tomonori
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Shimada Takashi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Mukai Toshikazu
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Asahi Hajime
The Institute of Scientific and Industrial Research, Osaka University 8-1 Mihogaoka, Ibaraki, Osaka 567, Japan
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Hayashi Toshihiko
The Institute of Scientific and Industrial Research, Osaka University 8-1 Mihogaoka, Ibaraki, Osaka 567, Japan
著作論文
- CuAu-Type Ordering Self-formed by Growing GaP/InP Short-Period Superlattices on GaAs (011) Substrate
- Straight Quantum Wires Self-Formed by Growing GaP/InP Short-Period Superlattices on GaAs(011) Substrate
- Improved Optical Properties of Strain-Induced Quantum Dots Self-Formed in GaP/InP Short-Period Superlattices
- Scanning Tunneling Microscopy Study on Self-Formation Process of Quantum Dot Structures by the Growth of GaP/InP Short-Period Superlattices on GaAs(311)A Substrate
- Vertical Quantum Confinement Effect on Optical Properties of Strain-Induced Quantum Dots Self-Formed in GaP/InP Short-Period Superlattices
- Scanning Tunneling Microscopy/Spectroscopy Study of Self-Organized Quantum Dot Structures Formed in GaP/InP Short-Period Superlattices ( Scanning Tunneling Microscopy)
- Gas Source Molecular Beam Epitaxy Growth of GaN-Rich Side of GaNP Alloys and Their Observation by Scanning Tunneling Microscopy ( Scanning Tunneling Microscopy)
- Self-Organized Dot/Columnar Structures and Quasi-Perfect CuPt-Type Ordering in (GaP)_n(InP)_n Superlattices Grown on GaAs (N11) Substrates by Gas Source Molecular Beam Epitaxy
- Scanning Tunneling Microscopy/Scanning Tunneling Spectroscopy Observation of III-V Compound Semicomductor Nanostructures
- Substrate Orientation Dependence of Optical Properties of GaP/AlP Short-Period Superlattices
- Photoluminescence Wavelength Dependence on Layer Structure of GaP/AlP Modulated Superlattices
- Improvement of Optical Properties of Multilayer Quantum Dots Self-Formed in GaP/InP Short-Period Superlattices on GaAs(311)A
- Time-Resolved Photoluminescence Study of Strain-Induced Quantum Dots Self-Formed in GaP/InP Short-Period Superlattice
- Growth Temperature Dependence of Self-Formation Process of Quantum Dot Structures in GaP/InP Short-Period Superlattices Grown on GaAs (311)A Substrate
- Possibility for the Discrimination of Submonolayer InAs and GaAs Grown on Tilted GaAs Substrate
- Formation of a High-Electrical-Resistance Region in InP by Ga Ion Implantation
- TlGaP Layers Grown on GaAs Substrates by Gas Source Molecular Beam Epitaxy
- Improved Growth Kinetic Model for Metalorganic Molecular Beam Epitaxy Using Triethylgallium
- Selective Area Epitaxy of GaSb by Metal-Organic Molecular Beam Epitaxy
- Growth of InMnAsSb:InSb Heterostructures with Mid-Infrared-Light-Induced Ferromagnetic Properties
- 1.3-1.6-μm-Wavelength Quantum Dots Self-Formed in GaAs/InAs Short-Period Superlattices Grown on InP (411)A Substrates : Semiconductors
- Field Emission from Polycrystalline GaN Grown on Mo Substrate : Semiconductors
- High Quality GaN Growth on (0001) Sapphire by Ion-Removed Electron Cyclotron Resonance Molecular Beam Epitaxy and First Observation of (2×2) and (4×4) Reflection High Energy Electron Diffraction Patterns
- Temperature-Stable Wavelength TlInGaAs/InP Double Heterostructure Light-Emitting Diodes Grown by Gas Source Molecular Beam Epitaxy
- Gas Source Molecular Beam Epitaxy Growth of TlInGaAs Layers on GaAs Substrates
- Growth of TlInGaAs on InP by Gas-Source Molecular Beam Epitaxy
- GaN-Rich Side of GaNAs Grown by Gas Source Molecular Beam Epitaxy
- Gas Source Molecular Beam Epitaxy Growth of GaN on C-, A-, R- and M-Plane Sapphire and Silica Glass Substrates
- Gas Source Molecular Beam Epitaxial Growth of GaN_P_x (x ≦ 0.015) Using Ion-Removed Electron Cyclotron Resonance Radical Cell
- New III-V Compound Semiconductors TlInGaP for 0.9 μm to over 10 μm Wavelength Range Laser Diodes and Their First Successful Growth
- Magnetic Properties of Eu-Doped GaN Grown by Molecular Beam Epitaxy
- In-Situ Selective Area Etching of GaAs in Metalorganic Molecular Beam Epitaxy Chamber using Trisdimethylaminoarsenic
- Current Injection Laser Oscillation in TlInGaAs/GaAs Double Quantum Well Diodes with InGaP Cladding Layers
- Growth and Characterization of GaCrN/AlGaN/GaCrN Trilayer Structures
- Nature of Deep-Level Defects in GaCrN Diluted Magnetic Semiconductor
- 1.3–1.5-μm-Wavelength GaAs/InAs Superlattice Quantum-Dot Light-Emitting Diodes Grown on InP (411)A Substrates
- Composition Analysis of High-Stable Transparent Conductive Zinc Oxide by X-ray Photoelectron Spectroscopy and Secondary Ion Mass Spectroscopy
- Epitaxial Growth of Ferromagnetic Cubic GaCrN on MgO Substrate
- Evaluation of Device Configurations through Cross-Sectional Planes along Gates of 0.1 μm Metal–Oxide–Semiconductor Field-Effect Transistors by Scanning Tunneling Microscopy/Scanning Tunneling Spectroscopy
- Current Injection Laser Operation of GaAs/InAs Short-Period Superlattice/InP(411) Quantum Dot Laser Diodes with InAlAs Current Blocking Layer
- Growth and Characterization of GaN Nanostructures toward Electron Field Emitter Application (SELECTED TOPICS IN APPLIED PHYSICS : Nano Electronics and Devices : Characterization and Control of Nano Surfaces and Interfaces)
- Growth and Characterization of GaN Nanostructures toward Electron Field Emitter Application
- Current Injection Laser Oscillation in TlInGaAs/GaAs Double Quantum Well Diodes with InGaP Cladding Layers
- In-Situ Selective Area Etching of GaAs in Metalorganic Molecular Beam Epitaxy Chamber using Trisdimethylaminoarsenic