Low Temperature BST-CVD Process for the Concave-Type Capacitors Designed for Logic-Base-Embedded DRAMs

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概要

• 論文の詳細を見る
• 2001-09-25

著者

• Mori Y

  Research Center For Ultra-precision Science And Technology Graduate School Of Engineering Osaka Univ

• Mori Yusuke

  Graduate School of Engineering, Osaka University

• Mori Yoshihiro

  Ulsi Process Technology Development Center Matsushita Electronics Corporation

• Mori Yoshihiro

  Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.

• TSUZUMITANI Akihiko

  ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co

• Okuno Yasutoshi

  Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology

• OKUNO Yasutoshi

  ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.

• OGAWA Hisashi

  ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.

• DORNFEST Charles

  Applied Materials

• JIN Xiaoliang

  Applied Materials

• KHER Shreyas

  Applied Materials

• TAO Jerry

  Applied Materials

• WANG Yaxin

  Applied Materials

• ZHAO Jun

  Applied Materials

• Mori Y

  Osaka Univ. Suita Jpn

• Okuno Y

  Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology

• Ogawa Hisashi

  Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.

• 奥野 泰利

  日本テキサスインスツルメンツ(株)、ulsi技術開発センター

• 奥野 泰利

  松下電器産業(株)

• Tsuzumitani Akihiko

  Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation

• Tsuzumitani Akihiko

  Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.

• Ogawa Hisashi

  Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.

• Mori Yuzo

  Department Of Mechanical Engineering Kochi National College Of Technology

• Okuno Yasutoshi

  ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp., 19, Nishikujo-kasuga cho, Minami-ku, Kyoto 601-8413, Japan

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