DORNFEST Charles | Applied Materials
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概要
関連著者
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DORNFEST Charles
Applied Materials
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KHER Shreyas
Applied Materials
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ZHAO Jun
Applied Materials
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LOU Lee
Applied Materials
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Kirby Aaron
Department Of Chemical And Materials Engineering And Center For Solid State Electronics Research Ari
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Mori Y
Research Center For Ultra-precision Science And Technology Graduate School Of Engineering Osaka Univ
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Mori Yusuke
Graduate School of Engineering, Osaka University
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Zhao J
Kwansei‐gakuin Univ. Hyogo Jpn
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Mori Yoshihiro
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Mori Yoshihiro
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.
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TSUZUMITANI Akihiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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Okuno Yasutoshi
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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OKUNO Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.
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OGAWA Hisashi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.
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JIN Xiaoliang
Applied Materials
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TAO Jerry
Applied Materials
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WANG Yaxin
Applied Materials
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Mori Y
Osaka Univ. Suita Jpn
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DEY Sandwip
Department of Chemical and Materials Engineering, and Center for Solid State Electronics Research, A
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MAJHI Prashant
Department of Chemical and Materials Engineering, and Center for Solid State Electronics Research, A
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SHIN Yong-W.
Department of Chemical and Materials Engineering, and Center for Solid State Electronics Research, A
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TANG Derek
Department of Chemical and Materials Engineering, and Center for Solid State Electronics Research, A
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KIRBY Aaron
Department of Chemical and Materials Engineering, and Center for Solid State Electronics Research, A
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Dey Sandwip
Department Of Chemical And Materials Engineering & Center For Solid State Electronics Research A
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Okuno Y
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Tang Derek
Department Of Chemical And Materials Engineering And Center For Solid State Electronics Research Ari
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Dey Sandwip
Department Of Chemical And Materials Engineering And Center For Solid State Electronics Research Ari
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Shin Yong-w.
Department Of Chemical And Materials Engineering And Center For Solid State Electronics Research Ari
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Ogawa Hisashi
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.
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奥野 泰利
日本テキサスインスツルメンツ(株)、ulsi技術開発センター
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奥野 泰利
松下電器産業(株)
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Majhi Prashant
Department Of Chemical And Materials Engineering & Center For Solid State Electronics Research A
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Tsuzumitani Akihiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Tsuzumitani Akihiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Ogawa Hisashi
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Mori Yuzo
Department Of Mechanical Engineering Kochi National College Of Technology
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Majhi Prashant
Department of Chemical and Materials Engineering, and Center for Solid State Electronics Research, Arizona State University, Tempe, AZ 85287-6006, USA
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Lou Lee
Applied Materials, Santa Clara, CA 95054, USA
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Kher Shreyas
Applied Materials, Santa Clara, CA 95054, USA
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Zhao Jun
Applied Materials, Santa Clara, CA 95054, USA
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Dey Sandwip
Department of Chemical and Materials Engineering, and Center for Solid State Electronics Research, Arizona State University, Tempe, AZ 85287-6006, USA
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Okuno Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp., 19, Nishikujo-kasuga cho, Minami-ku, Kyoto 601-8413, Japan
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Kirby Aaron
Department of Chemical and Materials Engineering, and Center for Solid State Electronics Research, Arizona State University, Tempe, AZ 85287-6006, USA
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Shin Yong-W.
Department of Chemical and Materials Engineering, and Center for Solid State Electronics Research, Arizona State University, Tempe, AZ 85287-6006, USA
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Dornfest Charles
Applied Materials, Santa Clara, CA 95054, USA
著作論文
- Low Temperature BST-CVD Process for the Concave-Type Capacitors Designed for Logic-Base-Embedded DRAMs
- Sub-300〓(Ba_x,Sr_)TiO_3 Films by Metal Organic Chemical Vapor Deposition: Nanostructure, Step Coverage, and Dielectric Properties
- Sub-300 Å (Bax,Sr1-x)TiO3 Films by Metal Organic Chemical Vapor Deposition: Nanostructure, Step Coverage, and Dielectric Properties