TSUZUMITANI Akihiko | ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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概要
- 同名の論文著者
- ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Coの論文著者
関連著者
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TSUZUMITANI Akihiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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Mori Yoshihiro
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Mori Yoshihiro
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.
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Okuno Yasutoshi
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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OKUNO Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.
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Okuno Y
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Tsuzumitani Akihiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Mori Y
Research Center For Ultra-precision Science And Technology Graduate School Of Engineering Osaka Univ
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Mori Yusuke
Graduate School of Engineering, Osaka University
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Mori Y
Osaka Univ. Suita Jpn
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奥野 泰利
日本テキサスインスツルメンツ(株)、ulsi技術開発センター
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奥野 泰利
松下電器産業(株)
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Tsuzumitani Akihiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Mori Yuzo
Department Of Mechanical Engineering Kochi National College Of Technology
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Okuno Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp., 19, Nishikujo-kasuga cho, Minami-ku, Kyoto 601-8413, Japan
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Yamamoto K
Kobayasi Institute Of Physical Research
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Shibata J
Japan Fine Ceramic Center Nagoya Jpn
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OGAWA Hisashi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.
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SHIBATA Jun
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
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SHIMIZU Tadami
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
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YAMAMOTO Kazuhiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
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Shimizu T
Univ. Occupational And Environmental Health Jpn
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Shimizu Tadao
Department Of Physics University Of Tokyo
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Shimizu T
Department Of Electrical And Electronic Engineering Kanazawa University
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Yamamoto K
Storage Media Systems Development Center Matsushita Elec. Ind. Co. Ltd.
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Shimizu T
Faculty Of Engineering Chiba University
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Shimizu T
Chiba Univ. Chiba Jpn
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Shibata Jun
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Yamamoto Kazuhiko
ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd., 19 Nishikujo-Kasugacho, Minami-ku, Kyoto 601-8413, Japan
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Yamamoto Kazuhiko
ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.
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Ichimura Hideo
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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OHTSUKA Takashi
The Engineering Department, Panasonic Semiconductor Engineering Co., Ltd.
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SHIBATA Yoshiyuki
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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ARAI Hideyuki
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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MATSUYAMA Seiji
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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UCHIYAMA Keita
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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SUZUKI Jun
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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YONEDA Kenji
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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HASHIMOTO Yukiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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NAKABAYASHI Takashi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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FUJII Eiji
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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TSUNEMINE Yoshikazu
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
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OKUDAIRA Tomonori
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
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KASHIHARA Keiichiro
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
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YUTANI Akie
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
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SHINKAWATA Hiroki
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
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MAZUMDER Motaharul
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
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OHNO Yoshikazu
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
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YONEDA Masahiro
LSI Manufacturing Technology Unit, Wafer Process Engineering Development Division, Renesas Technolog
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DORNFEST Charles
Applied Materials
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JIN Xiaoliang
Applied Materials
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KHER Shreyas
Applied Materials
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TAO Jerry
Applied Materials
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WANG Yaxin
Applied Materials
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ZHAO Jun
Applied Materials
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Yutani Akie
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Shinkawata Hiroki
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Mazumder Motaharul
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Fujii Eiji
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Yoneda Kenji
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Yoneda Kenji
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Arai Hideyuki
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Ogawa Hisashi
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.
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Shimizu Tatsuo
Faculty Of Technology
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Uchiyama Keita
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Matsuyama Seiji
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Hashimoto Yukiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Nakabayashi Takashi
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Shibata Yoshiyuki
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Ogawa Hisashi
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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Shimizu Tadao
Department Of Industrial Chemistry Chiba Institute Of Technology
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Shimizu Tadao
Department Of Physics Faculty Of Science The University Of Tokyo
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Ohtsuka Takashi
The Engineering Department Panasonic Semiconductor Engineering Co. Ltd.
著作論文
- A Highly Reliable MIM Technology with non-Crystallized HfOx Dielectrics Using Novel MOCVD Stacked TiN Bottom Electrodes
- Pt/Ba_xSr_TiO_3/Pt Capacitor Technology for 0.15μm Embedded Dynamic Random Access Memory
- Low Temperature BST-CVD Process for the Concave-Type Capacitors Designed for Logic-Base-Embedded DRAMs
- Extendibility of Ta_2O_5 Metal-Insulator-Metal Capacitor Using Ru Electrode
- Ru-Ta_2O_5MIM Capacitor toward 0.1μm DRAM Cell