Shimizu T | Chiba Univ. Chiba Jpn
スポンサーリンク
概要
関連著者
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SHIMIZU Tatsuo
Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazawa University
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Shimizu T
Department Of Electrical And Electronic Engineering Kanazawa University
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MORIMOTO Akiharu
Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazawa University
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Shimizu Tadao
Department Of Physics University Of Tokyo
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Shimizu T
Univ. Occupational And Environmental Health Jpn
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KUMEDA Minoru
Department of Electronics, Faculty of Technology, Kanazawa University
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Shimizu T
Faculty Of Engineering Chiba University
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Moto A
Department Of Electrical And Electronic Engineering Kanazawa University
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YONEZAWA Yasuto
Industrial Research Institute of Ishikawa (IRII)
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MINAMIKAWA Toshiharu
Industrial Research Institute of Ishikawa (IRII)
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Otsubo Shigeru
Department Of Electrical Engineering Ishikawa National College Of Tecchnology Tsubata
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Minamikawa Toshiharu
Industrial Research Institute Of Ishikawa
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MASUDA Atsushi
Japan Advanced Institute of Science and Technology
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Shimizu Tadao
Department Of Physics Science University Of Tokyo
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SHIMIZU Tadao
Department of Surgery, Tokyo Women's Medical University Daini Hospital.
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MASUDA Atsushi
Department of Pathology and Cell Regulation, Kyoto Prefectural University of Medicine
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SHIMIZU Tatsuo
Faculty of Engineering, Kanazawa University
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Maeda Toshihiro
Department of Cardiology, Komatsushima Red Cross Hospital
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YAMADA Satoru
Department of Periodontology, Tokyo Dental College
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Yamada S
Electronic Imaging And Devices Research Laboratory Fuji Xerox
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Yamada So
Electronic Imaging And Devices Research Laboratory Fuji Xerox Co. Lid.
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YAMANAKA Yasuhiro
Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazawa University
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Yamada Shoji
Shizuoka Institute Of Science And Technology
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YAMADA Satoru
Research Center for Heavy Ion Medicine, Gunma University
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SHIMIZU Takashi
Department of Neurosurgery, Saiseikai Kurihashi Hospital
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ANDO Akira
National Institute for Fusion Science
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後藤 誠
北陸職業能力開発大学校
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OHTSUBO Shigeru
Department of Medicine, Kidney Center, Tokyo Women's Medical University
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Yan H
Chinese Acad. Sci. Shanghai Chn
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ARAI Toshihiko
Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
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GOTO Miki
Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
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Yan Hui
Department Of Pediatrics Peking University First Hospital
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Ando Akira
Murata Mfg. Co. Ltd.
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Goto M
Matsushita Electric Industrial Co.
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Arai Takeshi
The Faculty Of Engineering Saitama University
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Shimada M
Hiroshima Univ. Higashi‐hiroshima
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Matsumoto K
Electrotechnical Lab. Ibaraki‐kenn Jpn
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Matsumoto Kazuhiko
Electrotechnical Laboratory (etl)
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Matsumoto Kazuhiko
Advanced Industrial Science And Technology:tsukuba University:crest
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MIKI Kazushi
Research Center for Advanced Carbon Materials and Nanotechnology Research Institute National Institu
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MIKI Kazushi
Nanotechnology Research Institute-AIST
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Yasuoka Y
National Defense Acad. Yokosuka‐shi Jpn
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Yasuoka Yoshizumi
Department Of Electrical And Electronic Engineering National Defense Academy
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Matsushima F
Department Of Physics Faculty Of Science The University Of Tokyo:(present Address) Department Of Phy
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Matsushima Fusakazu
Department Of Physics University Of Tokyo
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Matsushima Fusakazu
Department Of Physics Toyama University
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TOKUMOTO Hiroshi
Electrotechmical Laboratory
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GOTO Masashi
Matsushita Electric Industrial Co.
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ANDO Atsushi
Electrotechnical Laboratory (ETL)
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MIKI Kazushi
Electrotechnical Laboratory (ETL)
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MORITA Yukinori
National Institute for Advanced Interdisciplinary Research
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Morita Y
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Yan Hui
Department Of Electronics Faculty Of Technology Kanazawa University
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MOTO Akihiro
Department of Electronics, Faculty of Technology, Kanazawa University
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Tokumoto Hiroshi
Jrcat National Institute For Advanced Interdisciplinary Research
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Tokumoto Hiroshi
Elecltrotechnical Laboratory
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Tokumoto Hiroshi
Electrotechnical Laboratory (etl)
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Tokumoto Hiroshi
Joint Research Center For Atom Technology (jrcat)
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Tokumoto Hiroshi
Joint Research Center For Atom Technology (jrcat):national Institute Of Advanced Industrial Science
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Tokumoto Hiroshi
Joint Research Center For Atom Technology (jrcat)-national Institute Of Advanced Industrial Science
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Matsumoto Kazuhiko
Electrotechnical Laboratory (elt)
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Matsumoto Kazuhisa
Sumitomo Electric Industries Ltd.
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MINAMIKAWA Toshiharu
Department of Electrical and Computer Engineering, Faculry of Engineering, Kanazawa University
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SEGAWA Kazuhito
Industrial Research Institute of Ishikawa
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Ando A
Murata Mfg. Co. Ltd.
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石川 靖彦
静岡大学電子工学研究所
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石田 謙司
神戸大学 大学院工学研究応用化学専攻
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Uchida Takashi
Department of Urban Engineering, Osaka City University
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Mori Y
Research Center For Ultra-precision Science And Technology Graduate School Of Engineering Osaka Univ
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UEDA Yoshifumi
Department of Pharmacology, Gifu Pharmaceutical University
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Murakami M
Department Of Electrical And Electronic Engineering Kanagawa Institute Of Technology
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石田 謙司
神戸大学
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Mori Yusuke
Graduate School of Engineering, Osaka University
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MITANI Masahiro
Department of Radiology, Faculty of Medicine, Kagawa University
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MURAKAMI Masahiko
Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
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TAKAYAMA Daisuke
Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology
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Mori Yoshihiro
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Abe Tomoki
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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Yamamoto K
Kobayasi Institute Of Physical Research
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Shibata N
Japan Fine Ceramics Center Nagoya Jpn
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Sato Yasuhiko
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Shimada M
Ntt Microsystem Integration Lab. Kanagawa Jpn
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Mori Yoshihiro
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.
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Ueda Shigenori
Department Of Material Physics Graduate School Of Engineering Science Osaka University
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Ishikawa Y
Research Center For Interface Quantum Electronics And Graduate School Of Electronics And Information
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Ishida Koichi
Optoelectronics Joint Research Laboratory:(present Address) Fundamental Research Laboratories Nec Co
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Ishida K
Optoelectronics Joint Research Laboratory
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Ishikawa Y
Dowa Mining Co. Ltd. Tokyo
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Ishikawa Y
Department Of Electrical And Electronics Engineering Nippon Institute Of Technology
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Shibata J
Japan Fine Ceramic Center Nagoya Jpn
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ISHIKAWA Yukari
Japan Fine Ceramics Center
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SHIBATA Noriyoshi
Japan Fine Ceramics Center
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Arai E
Department Of Engineering Physics Electronics And Mechanics Nagoya Institute Of Technology
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Arai E
Nagoya Inst. Technol. Nagoya Jpn
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Arai E
Japan Oil Gas And Metals National Corp. Kawasaki‐shi Jpn
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Yasuoka Yoshizumi
Department of Electronic Engineering, The National Defense Academy
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KUMEDA Minoru
Laboratory for Development of Engineering Materials, Faculty of Technology, Kanazawa University
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TSUZUMITANI Akihiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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Okuno Yasutoshi
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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OKUNO Yasutoshi
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.
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SHIBATA Jun
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
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SHIMIZU Tadami
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
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YAMAMOTO Kazuhiko
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corporatio
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TACHIKAWA Maki
Department of Physics, Faculty of Science, The University of Tokyo
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Matsumoto S
Faculty Of Science And Technology Keio University
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Matsumoto Satoru
Department Of Electronics And Electrical Engineering Keio University
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Ishida K
Semiconductor System Engineering Center Toshiba Corporation
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SHIMIZU Takashi
Faculty of Science and Technology, Keio University
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TAKAGI Toshio
Faculty of Science and Technology, Keio University
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MATSUMOTO Satoru
Faculty of Science and Technology, Keio University
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SATO Yoshiyuki
NTT LSI Laboratories
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ARAI Eisuke
Nagoya Institute of Technology
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ABE Takao
SEH R&D Center, Shin-Etsu Handotai Co., Ltd.
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UEDA SHOICHI
Department of Urology, Kumamoto University
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Tachikawa M
Meiji Univ. Kawasaki Jpn
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Tachikawa Maki
Department Of Physics The University Of Tokyo
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Matsuda Kazuko
Faculty Of Engineering Kanazawa University
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Takagi Toshio
Faculty Of Science And Technology Keio University
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Mori Y
Osaka Univ. Suita Jpn
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Abe T
Seh Isobe R&d Center Shin-etsu Handotai Co. Ltd.
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Abe Takao
Shin-etsu Handotai
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Abe Takao
Shin-etsu Handotai Company
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Abe Takao
Seh R&d Center Shin-etsu Handotai Co. Ltd.
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Sato Y
Nagaoka Univ. Technol. Nagaoka Jpn
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Ishii N
Central Research Laboratory Tokyo Electron Ltd.
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Ishii Nobuo
Corporate R&d Central Research Laboratory Tokyo Electron Ltd.
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Shibata N
Ntt Optoelectronics Laboratories Nippon Telegraph And Telephone Corporation
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Nishino T
Mie Univ. Tsu Jpn
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Ishida Kohtaro
Department Of Physics Science University Of Tokyo
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Matsuda K
Univ. Cambridge Cambridge Gbr
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Ishida K
Yamagata Univ. Yamagata Jpn
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Ishikawa Y
Hokkaido Univ. Sapporo Jpn
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Sato Yuzuru
Seiko Epson Corp. Research And Development Div.
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Sato Y
Department Of Metallurgy Graduate School Of Engineering Tohoku University
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Shibata N
Japan Fine Ceramics Center Nggoya Jpn
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石田 謙司
神戸大学工学部応用化学科:神戸大学大学院工学研究科応用化学専攻
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ISHII Nobuhiko
Department o Electrical Engineertig, Fukui Institute of Technology
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ZHANG Qing
Department of Nephrology, Yan Tai Yu Huang Ding Hospital, Qing Dao University School of Medicine
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NISHIBE Yuki
Department of Electrical and Electronic Engineering, Kanazawa University
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ISHIDA Katsuei
Taiyo Yuden Co., Ltd.
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MASAKI Yuichi
Taiyo Yuden Co., Ltd.
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Okuno Y
Lsi Manufacturing Technology Unit Wafer Process Engineering Development Division Renesas Technology
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Yamamoto K
Storage Media Systems Development Center Matsushita Elec. Ind. Co. Ltd.
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Murakami Masahiko
Department Of Chemical Engineering Tohoku University
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Matsuda K
Waseda Univ. Tokyo Jpn
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Ishida K
Taiyo Yuden Co. Ltd.
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SUZUKI Tenmin
Department of Electrical and Computer Engineering, Faculry of Engineering, Kanazawa University
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Sato Y
Ntt Microsystem Integration Laboratories
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Kuze H
Center For Environmental Remote Sensing Chiba University
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SHIMIZU Toshiki
Japan Fine Ceramics Center
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Abe T
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tottori University
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KOBAYASHI Isao
Department of Laboratory Medicine and Clinical Laboratory Center, Gunma University School of Medicin
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Nagano Takayuki
Japan Fine Ceramics Center
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MIURA Takashi
Department of Cardiovascular Surgery, The Heart Institute of Japan, Tokyo Women's Medical University
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Namba S
Inst. Physical And Chemical Research Wako
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Horikoshi Keita
Department Of Electrical Engineering Kanagawa Institute Of Technology
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Fujioka Hiroyuki
Department Of Orthopedic Surgery Kobe University Graduate School Of Medicine
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Nakamura T
National Defense Acad. Kanagawa Jpn
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TAKAYAMA Daisuke
Toshiba Lighting & Technology Corporation
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SHIMIZU Tetsuya
Fujitsu Limited
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SHIMIZU Tetsuya
Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology
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Namba S
Japan Atomic Energy Res. Inst. Kyoto Jpn
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Namba S
Osaka Univ. Osaka
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Namba Susumu
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Namba Susumu
Nagasaki Institute Of Applied Science
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GAMO Kenji
Faculty of Engineering Science, Osaka University
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Nakamura Takanori
Functional Materials Research Dept. R & D Div. Murata Manufacturing Co. Ltd.
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NAKAMURA Takanori
Murata Manufacturing Co., Ltd.
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Fujioka Hiroyuki
Department Of Electrical And Electronic Engineering Kanagawa Institute Of Technology
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SAITO Masaaki
Department of Neurology, Brain Research Institute, Niigata University
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Shimizu T
Nagoya Univ. Nagoya Jpn
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HARAKAWA Kenichi
Department of Electronic Engineering, The National Defense Academy
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KUSUNOKI Michiko
Japan Fine Ceramics Center, FCT Central Research Department
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Kajita Masatoshi
Department Of Physics University Of Tokyo
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MATSUSHIMA Fusakazu
Department of Physics, Faculty of Science, The University of Tokyo
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Harakawa K
Takenaka Corp. Inzai Jpn
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MATSUDA Kazuko
Department of Pediatrics, Sapporo Medical University School of Medicine
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Gamo K
Osaka Univ. Osaka
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Gamo Kenji
Faculty Of Engineering Science And Research Center For Extreme Materials Osaka University
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Nonoyama Shinji
Quantum Material Research Laboratory Frontier Research Program The Institute Of Physical And Chemica
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MAEHARA Takanori
Department of Digital Engineering.
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NAKAZAWA Kenji
Department of Internal Medicine, Saiseikai Utsunomiya Hospital
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Namba Susumu
Research Center For Extreme Materials And Department Of Electrical Engineering Osaka University
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Namba Susumu
Frontier Research Program Riken
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Okagawa Takatoshi
Department Of Electrical And Computer Engineering Faculty Of Technology Kanazawa University
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Awaki Narimasa
Department of Electronics, Faculty of Technology, Kanazawa University
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Watanabe Takeshi
Central Research Laboratory, Hitachi,Ltd.
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SAIZAKI Masato
Department of Electrical and Electronic Engineering, Kanazawa University
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KITAJIMA Hiromichi
Department of Electrical and Electronic Engineering, Kanazawa University
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Miura Takashi
Department Of Applied Chemistry Faculty Of Science And Technology Keio University
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Miura Takashi
Department Of Electronics Faculty Of Technology Kanazawa University
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Nakamura T
Department Of Earth And Ocean Sciences National Defense Academy
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Suzuki T
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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ASOH Yoshinori
Ushio Inc.,
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SHIMIZU Tetuya
Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology
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Saito Masaaki
Department Of Electronics Faculty Of Technology Kanazawa University
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Matsuda Kazuko
Department Of Pediatrics Sapporo Medical University School Of Medicine
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YONEZAWA Yasuto
Faculty of Engineering, Kanazawa University
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MORIMOTO Akiharu
Faculty of Engineering, Kanazawa University
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Itoh K
Jichi Medical School Tochigi Jpn
著作論文
- Measurement of Diffusion Coefficient of CF_2 Radical in DC Pulsed CF_4/H_2 Discharge Plasma
- Measurements of Diffusion Coefficient of CF_2 Radical in DC Pulsed CF_4/O_2 Discharge Plasma ( Plasma Processing)
- Effect of Oxygen Pressure on (Ba_xSr_)TiO_3 Thin Films by Pulsed Laser Ablation
- Effects of Heat Treatment on the Sensitivity of Warm Carrier Devices for CH_3OH Laser Radiation
- Extendibility of Ta_2O_5 Metal-Insulator-Metal Capacitor Using Ru Electrode
- Ru-Ta_2O_5MIM Capacitor toward 0.1μm DRAM Cell
- Fraction of Interstitialcy Component of Phosphorus and Antimony Diffusion in Silicon
- Fraction of Interstitialcy Component of Phosphorus and Antimony Diffusion in Silicon
- Identification of a New Defect in Silicon Nitride Films
- Thermal Equilibration of Defect Density in Hydrogenated Amorphous Silicon-Germanium Alloys
- Comparison between ESR and CPM for the Gap States in a-Si-Ge:H
- Temperature Simulation of Cooling Process of Ge Droplets in Laser Droplet Epitaxy(Surfaces, Interfaces, and Films)
- Preparation of Twin- and Crack-Free LiNbO_3 Films by Pulsed Laser Ablation Using Nucleation Process at High Temperature : Surfaces, Interfaces, and Films
- Rotational Honeycomb Epitaxy of Ru Thin Films on Sapphire (0001) Substrate : Surfaces, Interfaces, and Films
- Preparation of Pb(Zn_Ti_)O_3 Films by Laser Ablation
- Thermal Analysis of Target Surface in the Ba-Y-Cu-O Film Preparation by Laser Ablation Method
- Preparation of Ba-Y-Cu-O Superconducting Films by Laser Ablation with and without Laser Irradiation on Growing Surface : Special Section : Solid State Devices and Materials 2 : Thin Film Devices and Superconductors
- a-Si_O_x:H Films Prepared by Direct Photo-CVD Using CO_2 Gas : Condensed Matter
- Preparation of Ba_2YCu_3O_x Superconducting Films by Laser Evaporation and Rapid Laser Annealing : Electrical Properties of Condensed Matter
- Measurements of Diffusion Coefficient of CF_2 Radical in DC Pulsed CF_4 Discharge Plasma
- Preparation of Bi-Iron-Garnet Films on Platinized Si Substrate with Bi-Substituted Y-Iron-Garnet Template Layer (レーザーによる薄膜形成と制御小特集号)
- Mechanism of Stoichiometric Deposition of Volatile Elements in Multimetal-Oxide Films Prepared by Pulsed Laser Ablation
- Annealing Temperature Dependence of MgO Substrates on the Quality of YBa_2Cu_3O_x Films Prepared by Pulsed Laser Ablation
- Creation of Highly Oriented Freestanding Carbon Nanotube Film by Sublimating Decomposition of Silicon Carbide Film
- Epitaxial Growth of 3C-SiC on Thin Silicon-on-Insulator Substrate by Chemical Vapor Deposition Using Alternating Gas Supply
- Surface Observation and Modification of Si Substrate in NH_4F and H_2SO_4 Solutions
- Surface Observation and Modification of Si Substrate in Solutions
- Electrochemical Scanning Tunneling Microscopy and Atomic Force Microscopy Observationson Si(111) in Several Solutions
- Dynamics of Trapped Ions in the Presence of Laser Cooling and Radio-Frequency Heating
- Collision Cooling of Ions Stored in Quadrupole Radio-Frequency Trap
- Temperature-Independent Photoluminescence in Amorphous Si_C_x:(F,H) Films with Low Defect Density
- Properties of Hydrogenated Amorphous Si-N Prepared by Various Methods
- Thin Film Patterning by Laser Lift-Off
- Comparative Study of Defect Densities Evaluated by Electron Spin Resonance and Constant Photocurrent Method in Undoped and N-Doped Hydrogenated Amorphous Silicon
- Electron-Beam-Induced Nucleation Centers and Selective Deposition of Thin Zinc Films
- Photocreated Defects in Very Thin Hydrogenated Amorphous Silicon Films : Semiconductors
- Partial Recovery of Photodegradation at Room Temperature in Hydrogenated Amorphous Silicon
- Relation between Electron-Spin-Resonance and Constant-Photocurrent-Method Defect Densities in Hydrogenated Amorphous Silicon
- Preparation of Epitaxial Ge Film on Si by Pulsed Laser Ablation Using Molten Droplets
- Change of Spin-Lattice Relaxation Time with Light Soaking for Defects in Hydrogenated Amorphous Silicon
- Removal of Surface Oxides on Copper by Pulsed Laser lrradiation
- Relation between ESR and Hydrogen in Magnetron-Sputtered a-Ge:H
- Antenna-Coupled Warm Carrier Device Using Polycrystalline Ge Film Vacuum Deposited on ZnS Substrate
- Hydrogen Incorporation Scheme in Amorphous-Microcrystalline Mixed-Phase Si: H Films
- Magneto-Optical Characteristics of Bi-Substituted Rare-Earth Iron Garnet Films Prepared by Laser Ablation
- Influence of Laser Fluence on Structural and Ferroelectric Properties of Lead-Zirconate-Titanate Thin Films Prepared by Laser Ablation : Thin Films
- Annealing Studies on Hydrogenated Amorphous Silicon-Tin Films
- ESR and Raman Studies on Hydrogenated Amorphous Si-Sn
- Influence of Hydrogen Content and Si-H Bond Structure on Photocreated Dangling Bonds in Hydrogenated Amorphous Silicon Films
- Influence of Light-Soaking Temperature on the Distribution of Thermal-Annealing Activation Energies for Photocreated Dangling Bonds in Hydrogenated Amorphous Silicon
- Distributions of Thermal-Annealing Activation Energies for Light-Induced Spins in Fast and Slow Processes in a-Si_N_x:H Alloys
- Light-Induced ESR in Variously Treated Hydrogenated Amorphous Silicon
- Light-induced Annealing of Photocreated Dangling Bonds in Hydrogenated Amorphous Silicon
- Relationship between Electrical Conductivity and Charged-Dangling-Bond Density in Nitrogen- and Phosphorus-Doped Hydrogenated Amorphous Silicon
- Light-Induced-ESR Study of Undoped and N-Doped Hydrogenated Amorphous Silicon
- Decay Behavior of Light-Induced ESR in Hydrogenated Amorphous Silicon-Nitrogen Alloys
- Spectroscopic Study on N_O-Plasrma Oxidation of Hydrogenated Amorphous Silicon and Behavior of Nitrogen
- Light Soaking of a-Si:H at 77 K
- A Model for the Staebler-Wronski Effect Based on Charged Impurities
- Effect of Charged Defects on Properties of Amorphous Si-Based Alloys
- Molecular Beam Studies of Thermal Decomposition of Glycine on Solid Surfaces
- Construction of a Highly Sensitive Spectrometer in the Visible Region
- Observation and Analysis of Visible Overtone Band Transitions of NH_3
- Reduction of Droplet Formatiom by Reducing Target Etching Rate in Pulsed Laser Ablation
- Laser-Irradiation Induced a-Axis Orientation in c-Axis-Oriented YBa_2Cu_3O_x Films Prepared by Pulsed Laser Ablation
- ESR and X-Ray Diffraction Studies on Ba-Y-Cu-O Superconductors : Electrical Properties of Condensed Matter
- Preparation of Ti-Al-N Electrode Films by Pulsed Laser Ablation for Lead-Zirconate-Titanate Film Capacitors
- Highty Oriented Pb(Zr, Ti)O_3 Thin Films Prepared by Pulsed Laser Ablation GaAs and Si Substrates with MgO Buffer Layer
- Fatigue Behavior in Lead-Zirconate-Titanate Thin-Film Capacitors Prepared by Pulsed Laser Ablation on Ni-Alloy Electrodes
- NH_3-Plasma-Nitridation Process of (100) GaAs Surface Observed by Angle-Dependent X-Ray Photoelectron Spectroscopy
- Improvement of Responsivity of Antenna-Coupled Warm Carrier Device Using Polycrystalline Ge Thin Films
- Relationship between Photodarkening and Light-Induced ESR in Amorphous Ge-S Films Alloyed with Lead
- Light-Induced Effects and Their Annealing Behavior in a-Si:H
- Photo-Induced ESR in Amorphous Si_N_x:H Films
- Highly Sensitive Laser Spectroscopic Method for Measurement of Collisional Relaxation Parameters of Molecules
- Effect of Reduction in Impurity Content for a-Si:H Films
- ESR and Constant Photocurrent Studies of Surface and Bulk Defects in a-Si:H
- Hydrogen Evolution from Amorphous Si-N Films
- Light-Induced Effects in a-Si:H Studied by ESR and Electrical Measurements
- Evidence of the Existence of SiF_4 Molecules in Fluorinated Amorphous Silicon
- Structural Analysis on T_c Variation of Bi_2Sr_Ca_Cu_2O_
- Stabilization of Tunable Diode Lasers for Spectroscopy of Low Density Gases