SHIBATA Noriyoshi | Japan Fine Ceramics Center
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概要
関連著者
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SHIBATA Noriyoshi
Japan Fine Ceramics Center
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ISHIKAWA Yukari
Japan Fine Ceramics Center
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Nagano Takayuki
Japan Fine Ceramics Center
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Shibata N
Japan Fine Ceramics Center Nagoya Jpn
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Ishikawa Y
Research Center For Interface Quantum Electronics And Graduate School Of Electronics And Information
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Ishikawa Y
Dowa Mining Co. Ltd. Tokyo
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SAITO Tomohiro
Japan Fine Ceramics Center
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Shibata N
Ntt Optoelectronics Laboratories Nippon Telegraph And Telephone Corporation
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Ishikawa Y
Hokkaido Univ. Sapporo Jpn
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Shibata N
Japan Fine Ceramics Center Nggoya Jpn
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HARADA Masashi
Japan Fine Ceramics Center
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石川 靖彦
静岡大学電子工学研究所
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Ishikawa Y
Department Of Electrical And Electronics Engineering Nippon Institute Of Technology
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Ito Hiroki
Japan Fine Ceramics Center
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YAMASHITA Masashi
Japan Fine Ceramics Center (JFCC)
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SASAKI Yukichi
Japan Fine Ceramics Center (JFCC)
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Shimizu T
Univ. Occupational And Environmental Health Jpn
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Miyauchi Michihiro
Japan Fine Ceramics Center
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Shimizu Tadao
Department Of Physics University Of Tokyo
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Shimizu T
Department Of Electrical And Electronic Engineering Kanazawa University
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Saito T
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Shimizu T
Faculty Of Engineering Chiba University
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SHIMIZU Toshiki
Japan Fine Ceramics Center
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Shimizu Tatsuo
Faculty Of Technology
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Shimizu T
Chiba Univ. Chiba Jpn
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Saito T
School Of Engineering Nagoya University
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Shimizu Tadao
Department Of Industrial Chemistry Chiba Institute Of Technology
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Shimizu Tadao
Department Of Physics Faculty Of Science The University Of Tokyo
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SUGAWARA Yoshihiro
Japan Fine Ceramics Center (JFCC)
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ZAIMA Shigeaki
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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SAKASHITA Mitsuo
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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Sakashita Mitsuo
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Sakashita Mitsuo
Department Of Crystalline Materials Science School Of Engineering Nagoya University
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Sakashita Mitsuo
Japan Fine Ceramics Center
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Sakashita M
Nagoya Univ. Nagoya Jpn
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Sasaki Yasuhiro
Display Device Development Division Nec Corporation
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Nagano Takeshi
Department Of Electrical And Electronics Engineering Sophia University
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Zaima Shigeaki
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Wang Yongqiang
Institute Of Genetic Resources Kyushu University
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Wang Yongqiang
Japan Fine Ceramics Center
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Yonemitsu Kyoko
Japan Fine Ceramics Center
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Sasaki Yasuhiro
Functional Devices And Material Laboratories Nec Corporation
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MATSUNAGA Yasuo
Japan Fine Ceramics Center (JFCC)
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MATSUBARA Hideaki
Japan Fine Ceramics Center (JFCC)
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KUSUNOKI Michiko
Japan Fine Ceramics Center, FCT Central Research Department
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Sasaki Yukichi
Japan Fine Ceramics Center
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Nagano Takayuki
Japan Fine Ceramics Center:(present Address)development Division Ii Suzuki Motor Corporation
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Fukatsu Susumu
Department Of Pure And Applied Sciences The University Of Tokyo
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Fukatsu Susumu
Department Of Applied Physics Faculty Of Engineering The University Of Tokyo
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Ohsato Hitoshi
Dept. Of Materials Sci. And Eng. Nagoya Inst. Of Tech.
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Maeda Masunobu
Department Of Applied Chemistry Nagoya Institute Of Technology
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Kusunoki Michiko
Japan Fine Ceramics Center
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Nomura Kenji
Department Of Applied Chemistry Nagoya Institute Of Technology
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TAKEDA Yasutoshi
Japan Fine Ceramics Center
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Yamashita Masashi
Japan Fine Ceramics Center:dept. Of Materials Sci. And Eng. Nagoya Inst. Of Tech.
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KAWASHIMA Humiyuki
Japan Fine Ceramics Center
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Higashida Yutaka
Japan Fine Ceramics Center
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ANDO Minato
On leave from NGK Spark Plug Co. Ltd
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Kawashima Humiyuki
Japan Fine Ceramics Center:material And Devices Development Center Toshiba Corporation
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Bessho Takeshi
Higashifuji Technical Center Toyota Motor Corporation
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SUZUKI Hiroshi
Higashifuji Technical Center, Toyota Motor Corporation
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Saitoh Hiroaki
Higashifuji Technical Center Toyota Motor Corporation
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Kawai Yoichiro
Higashifuji Technical Center Toyota Motor Corporation
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Danno Katsunori
Higashifuji Technical Center Toyota Motor Corporation
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Yao Yong-zhao
Japan Fine Ceramics Center (jfcc)
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DANNO Katsunori
Toyota Motor Corporation
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SUZUKI Hiroshi
Toyota Motor Corporation
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Salonen Jarno
Department of Physics, University of Turku, Turku FI-20014, Finland
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Vasin Andriy
Japan Fine Ceramics Center, Nagoya 456-8587, Japan
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Lehto Vesa-Pekka
Department of Physics, University of Turku, Turku FI-20014, Finland
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Ishikawa Yukari
Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
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Ishikawa Yukari
Japan Fine Ceramics Center, Nagoya 456-8587, Japan
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Shibata Noriyoshi
Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
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Sugawara Yoshihiro
Japan Fine Ceramics Center, Nagoya 456-8587, Japan
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Kawai Yoichiro
Higashifuji Technical Center, Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
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Bessho Takeshi
Higashifuji Technical Center, Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
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Danno Katsunori
Higashifuji Technical Center, Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
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Nagano Takayuki
Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
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Saitoh Hiroaki
Higashifuji Technical Center, Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
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Harada Masashi
Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
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TANAKA Shigeru
Japan Fine Ceramics Center
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Saitoh Hiroaki
Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
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Kawai Yoichiro
Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
著作論文
- Formation of Au and AuSi_x-Pyramids in Separation by Implanted Oxygen Wafers with Si Pillars in SiO_2 Layer
- 12-O-08 Oxidation Behavior of Aluminum Nitride Thin Films on Si and Superalloy Substrates
- X-Ray Chemical Analysis of Multilayered Thin Films by Scanning Electron Microscopy and Total-Reflection-Angle X-Ray Spectroscopy
- In Situ Transmission Electron Microscopy Observation of Au-Si Interface Reaction
- Creation of Highly Oriented Freestanding Carbon Nanotube Film by Sublimating Decomposition of Silicon Carbide Film
- Epitaxial Growth of 3C-SiC on Thin Silicon-on-Insulator Substrate by Chemical Vapor Deposition Using Alternating Gas Supply
- Fabrication of Aluminum Nitride Thin Film and Its Oxidation Behavior
- Room-Temperature Visible Photoluminescence from Single Crystal Si Quantum Well Structures
- Surface Etching of 6H-SiC(0001) by Annealing in Vacuum for Obtaining an Atomically Flat Surface
- Molten KOH etching with Na2O2 additive for dislocation revelation in 4H-SiC epilayers and substrates
- Cathodoluminescence Measurement of Surfaces in Reflection High-Energy Electron Diffraction Experiments
- Creation of Highly-Ordered Si Nanocrystal Dots Suspended in SiO_2 by Molecular Beam Epitaxy with Low Energy Oxygen Implantation ( Quantum Dot Structures)
- In situ Observation of the Crystallization Process of Ferroelectric Thin Films by Raman Microspectroscopy
- Substrate-Polarity Dependence of AIN Single-Crystal Films Grown on 6H-SiC(0001) and (0001^^-) by Molecular Beam Epitaxy
- Growth of Aluminum Nitride Films on Silicon by Electron-Cyclotron-Resonance-Assisted Molecular Beam Epitaxy
- Diamond Synthesis by Microwave-Plasma Chemical Vapor Deposition Using CH_3Cl and CH_2Cl_2 as Carbon Source
- Effect of Mixed Argon and Nitrogen Ion Beam on Cubic Boron Nitride Film Formation in Ion-Beam-Assisted Deposition
- Preparation of Thin Silicon-on-Insulator Films by Low-Energy Oxygen Ion Implantation
- Forsterite-based Ceramics for Microwave Application with Low Loss and Low Temperature-Coefficient of Relative Permittivity
- Production of Highly Oriented Carbon Nanotube Film by Surface Decomposition of Silicon Carbide Polycrystalline Film
- Preparation of Silicon-on-Insulator Substrate on Large Free-Standing Carbon Nanotube Film Formation by Surface Decomposition of SiC Film
- Effects of Surface Oxides of SiC on Carbon Nanotube Formation by Surface Decomposition
- Microscopic Structure of Stepwise Threading Dislocation in 4H-SiC Substrate
- Strong White Photoluminescence from Carbon-Incorporated Silicon Oxide Fabricated by Preferential Oxidation of Silicon in Nano-Structured Si:C Layer
- Substrate-Polarity Dependence of AlN Single-Crystal Films Grown on 6H–SiC(0001) and ($000\bar{1}$) by Molecular Beam Epitaxy
- Near-Infrared Light Emissions from Er-doped ZnO Thin Films Induced by an Electrical Field