Diamond Synthesis by Microwave-Plasma Chemical Vapor Deposition Using CH_3Cl and CH_2Cl_2 as Carbon Source
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概要
- 論文の詳細を見る
Polycrystalline diamond films have been synthesized from gas mixture systems of CH_2Cl_2-H_2 and CH_3Cl-H_2 by the microwave-plasma chemical vapor deposition (CVD) technique. The gas reaction speed was promoted by using CH_3Cl and CH_2CL_2, although the deposition rate decreased, due probably to surface etching by the chlorine in the case of high-concentration CH_2Cl_2. A broad band centered at about 1500 cm^<-1> in the Raman spectra decreased considerably in the films compared with those synthesized from the CH_4-H_2 gas mixture. Very little residual chlorine was detected in the deposited films. The use of chlorine-permuted methane as a carbon source was found to be advantageous for high-purity diamond deposition at low temperature and high concentration.
- 社団法人応用物理学会の論文
- 1993-11-15
著者
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Nagano Takayuki
Japan Fine Ceramics Center
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Nagano Takeshi
Department Of Electrical And Electronics Engineering Sophia University
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SHIBATA Noriyoshi
Japan Fine Ceramics Center
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Nagano Takayuki
Japan Fine Ceramics Center:(present Address)development Division Ii Suzuki Motor Corporation
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