ISHIKAWA Yukari | Japan Fine Ceramics Center
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概要
関連著者
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ISHIKAWA Yukari
Japan Fine Ceramics Center
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SHIBATA Noriyoshi
Japan Fine Ceramics Center
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Shibata N
Japan Fine Ceramics Center Nagoya Jpn
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Ishikawa Y
Research Center For Interface Quantum Electronics And Graduate School Of Electronics And Information
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Ishikawa Y
Dowa Mining Co. Ltd. Tokyo
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SAITO Tomohiro
Japan Fine Ceramics Center
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Shibata N
Ntt Optoelectronics Laboratories Nippon Telegraph And Telephone Corporation
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Ishikawa Y
Hokkaido Univ. Sapporo Jpn
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Shibata N
Japan Fine Ceramics Center Nggoya Jpn
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Sato Koji
Japan Fine Ceramics Center
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SUGAWARA Yoshihiro
Japan Fine Ceramics Center (JFCC)
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Nagano Takayuki
Japan Fine Ceramics Center
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Yao Yong-zhao
Japan Fine Ceramics Center (jfcc)
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DANNO Katsunori
Toyota Motor Corporation
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SUZUKI Hiroshi
Toyota Motor Corporation
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石川 靖彦
静岡大学電子工学研究所
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Ishikawa Y
Department Of Electrical And Electronics Engineering Nippon Institute Of Technology
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Shimizu T
Univ. Occupational And Environmental Health Jpn
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Shimizu Tadao
Department Of Physics University Of Tokyo
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Shimizu T
Department Of Electrical And Electronic Engineering Kanazawa University
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Saito T
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Shimizu T
Faculty Of Engineering Chiba University
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SHIMIZU Toshiki
Japan Fine Ceramics Center
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Shimizu Tatsuo
Faculty Of Technology
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BESSHO Takeshi
Toyota Motor Corporation
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Shimizu T
Chiba Univ. Chiba Jpn
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HARADA Masashi
Japan Fine Ceramics Center
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Saito T
School Of Engineering Nagoya University
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Kawasaki Shinji
Department Of Bioscience Tokyo University Of Agriculture
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Shimizu Tadao
Department Of Industrial Chemistry Chiba Institute Of Technology
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Shimizu Tadao
Department Of Physics Faculty Of Science The University Of Tokyo
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Bessho Takeshi
Higashifuji Technical Center Toyota Motor Corporation
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SUZUKI Hiroshi
Higashifuji Technical Center, Toyota Motor Corporation
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Danno Katsunori
Higashifuji Technical Center Toyota Motor Corporation
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ZAIMA Shigeaki
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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SAKASHITA Mitsuo
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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Sakashita Mitsuo
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Sakashita Mitsuo
Department Of Crystalline Materials Science School Of Engineering Nagoya University
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Sakashita Mitsuo
Japan Fine Ceramics Center
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Sakashita M
Nagoya Univ. Nagoya Jpn
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Zaima Shigeaki
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Wang Yongqiang
Institute Of Genetic Resources Kyushu University
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Wang Yongqiang
Japan Fine Ceramics Center
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KUSUNOKI Michiko
Japan Fine Ceramics Center, FCT Central Research Department
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Miyauchi Michihiro
Japan Fine Ceramics Center
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Fukatsu Susumu
Department Of Pure And Applied Sciences The University Of Tokyo
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Fukatsu Susumu
Department Of Applied Physics Faculty Of Engineering The University Of Tokyo
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Muto Shunsuke
Division Of Energy Science Center For Integrated Research In Science And Engineering Nagoya Universi
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Kusunoki Michiko
Japan Fine Ceramics Center
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DANNO Katsunori
Higashifuji Technical Center, Toyota Motor Corporation
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Saitoh Hiroaki
Higashifuji Technical Center Toyota Motor Corporation
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Kawai Yoichiro
Higashifuji Technical Center Toyota Motor Corporation
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Salonen Jarno
Department of Physics, University of Turku, Turku FI-20014, Finland
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Vasin Andriy
Japan Fine Ceramics Center, Nagoya 456-8587, Japan
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Lehto Vesa-Pekka
Department of Physics, University of Turku, Turku FI-20014, Finland
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Matsumura Akihiro
Department of Frontier Materials, Nagoya Institute of Technology, Nagoya 466-8555, Japan
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ISHII Yosuke
Department of Cardiovascular Surgery, Nippon Medical School Chiba Hokusoh Hospital
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Ishikawa Yukari
Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
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Ishikawa Yukari
Japan Fine Ceramics Center, Nagoya 456-8587, Japan
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Sugawara Yoshihiro
Japan Fine Ceramics Center, Nagoya 456-8587, Japan
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Kawai Yoichiro
Higashifuji Technical Center, Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
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Bessho Takeshi
Higashifuji Technical Center, Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
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Danno Katsunori
Higashifuji Technical Center, Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
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Nagano Takayuki
Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
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Saitoh Hiroaki
Higashifuji Technical Center, Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
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Harada Masashi
Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
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TANAKA Shigeru
Japan Fine Ceramics Center
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Yamamoto Yuta
EcoTopia Science Institute, Nagoya University, Nagoya 464-8603, Japan
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Ishi Yosuke
Department of Materials Science and Engineering, Nagoya Institute of Technology, Nagoya 466-8555, Japan
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Saitoh Hiroaki
Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
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Kawai Yoichiro
Toyota Motor Corporation, Susono, Shizuoka 410-1193, Japan
著作論文
- Formation of Au and AuSi_x-Pyramids in Separation by Implanted Oxygen Wafers with Si Pillars in SiO_2 Layer
- In Situ Transmission Electron Microscopy Observation of Au-Si Interface Reaction
- Creation of Highly Oriented Freestanding Carbon Nanotube Film by Sublimating Decomposition of Silicon Carbide Film
- Epitaxial Growth of 3C-SiC on Thin Silicon-on-Insulator Substrate by Chemical Vapor Deposition Using Alternating Gas Supply
- Room-Temperature Visible Photoluminescence from Single Crystal Si Quantum Well Structures
- Molten KOH etching with Na2O2 additive for dislocation revelation in 4H-SiC epilayers and substrates
- Creation of Highly-Ordered Si Nanocrystal Dots Suspended in SiO_2 by Molecular Beam Epitaxy with Low Energy Oxygen Implantation ( Quantum Dot Structures)
- Substrate-Polarity Dependence of AIN Single-Crystal Films Grown on 6H-SiC(0001) and (0001^^-) by Molecular Beam Epitaxy
- Growth of Aluminum Nitride Films on Silicon by Electron-Cyclotron-Resonance-Assisted Molecular Beam Epitaxy
- Preparation of Thin Silicon-on-Insulator Films by Low-Energy Oxygen Ion Implantation
- White Photoluminescence from Carbon-Incorporated Silica Fabricated from Rice Husk (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Dislocation Revelation from (0001) Carbon-face of 4H-SiC by Using Vaporized KOH at High Temperature
- Preparation of Silicon-on-Insulator Substrate on Large Free-Standing Carbon Nanotube Film Formation by Surface Decomposition of SiC Film
- Effects of Surface Oxides of SiC on Carbon Nanotube Formation by Surface Decomposition
- Effects of Synthesis Process on Luminescence Properties and Structure of Mesoporous Carbon-Silica Nanocomposite
- Microscopic Structure of Stepwise Threading Dislocation in 4H-SiC Substrate
- Dislocation Revelation from (0001) Carbon-face of 4H-SiC by Using Vaporized KOH at High Temperature
- Strong White Photoluminescence from Carbon-Incorporated Silicon Oxide Fabricated by Preferential Oxidation of Silicon in Nano-Structured Si:C Layer
- Substrate-Polarity Dependence of AlN Single-Crystal Films Grown on 6H–SiC(0001) and ($000\bar{1}$) by Molecular Beam Epitaxy
- Near-Infrared Light Emissions from Er-doped ZnO Thin Films Induced by an Electrical Field
- Comparison of slicing-induced damage in hexagonal SiC by wire sawing with loose abrasive, wire sawing with fixed abrasive, and electric discharge machining