Saito T | School Of Engineering Nagoya University

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著作論文

Formation of Au and AuSi_x-Pyramids in Separation by Implanted Oxygen Wafers with Si Pillars in SiO_2 Layer
Studies of Boron Segregation to {311} Defects in Silicon-Implanted Silicon
Boron Segregation to {311} Defects Induced by Self-Implantation Damage in Si
Boron Accumulation in the {311} Defect Region Induced by Self-Implantation into Silicon Substrate
Noncontact Ultrasonic Imaging of Subsurface Defects Using a Laser-Ultrasonic Technique
Sub-1.3 nm Amorphous Tantalum Pentoxide Gate Dielectrics for Damascene Metal Gate Transistors
Sub 1.3nm Amorphous Ta_2O_5 Gate Dielectrics for Damascene Metal Gate Transistor
Highly Uniform Low-Pressure Chemical Vapor Deposition (LP-CVD) of Si_3N_4 Film on Tungsten for Advanced Low-Resistivity "Polymetal" Gate Interconnects
Plasma-Damage-Free Gate Process Using Chemical Mechanical Polishing for 0.1 μm MOSFETs
Plasma Damage Free Gate Process Using CMP for 0.1um MOSFETs
Magnetic Properties and Magnetoresistance of Granular Evaporated Fe/Si Films
The Exchange-Coupled Field in NiO/Ni Double Layer on Silica Substrates
Effects of Cleavage on Local Cross-Sectional Stress Distribution in Trench Isolation Structure
Ternperature Dependence of Faraday Rotation in Co^2+-Substituted Hexaferrites
Main Cause of Surface Waveguides Formed under LiNbO_3 Crystal Surface during Thermal Treatment
Effects of Cleavage on Local Cross-Sectional Stress Distribution in Trench Isolation Structure
Exchange Coupling in NiO/Ni Double Layer Films
In Situ Transmission Electron Microscopy Observation of Au-Si Interface Reaction
Calculation of Absorption Spectra of YBa_2Cu_3O_ by Means of Xα Method
Three-Dimensional Imaging of Carbon Nanotubes : Structure and Mechanical and Thermal Properties of Condensed Matter
Optical Characterization of Quench-Deposited PbBr_2 Films and Their Annealing Behavior

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