Optical Characterization of Quench-Deposited PbBr_2 Films and Their Annealing Behavior
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概要
- 論文の詳細を見る
High-quality amorphous PbBr_2 films were obtained by quench deposition onto fused-silica substrates cooled to 77 K. The films exhibited a well-defined crystallization temperature (T_c) of 335 K. The as-deposited films were stable at temperatures up to 160 K and relaxed to new stable random networks upon annealing at higher (but below T_c) temperatures. The optical spectra in the amorphous phase were characterized by a prominent first absorption band of nonexcitonic origin. Below the absorption edge, the amorphous films showed a very high transparency (absorption coefficients, less than 10^2 cm^<-1> below 3 eV) never achieved by deposition onto hot substrates.
- 社団法人応用物理学会の論文
- 1993-10-15
著者
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KONDO Shin-ichi
Department of Chemistry, Faculty of Science and Engineering, Ritsumeikan University
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Kondo Shin-ichi
Department Of Applied Physics Faculty Of Engineering Fukui University
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SAITO Tadaaki
Department of Applied Physics,Faculty of Engineering,Fukui University
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Saito Tadaaki
Department Of Applied Physics Faculty Of Engineering Fukui University
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ARAKAWA Tamotsu
Department of Applied Physics, Faculty of Engineering, Fukui University
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Saito T
School Of Engineering Nagoya University
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Arakawa Tamotsu
Department Of Applied Physics Faculty Of Engineering Fukui University
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KONDO Shin-ichi
Department of Applied Physics, Faculty of Engineering, Fukui University
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