SUGURO Kyoichi | Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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概要
関連著者
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SUGURO Kyoichi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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Suguro K
Toshiba Corporation Semiconductor Company
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Suguro Kyoichi
Toshiba Corporation Semiconductor Company
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Yagishita A
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Saito Tomohiro
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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NAKAJIMA Kazuaki
Microelectronics Engineering Labs., Toshiba Corporation
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YAGISHITA Atsushi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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Nakajima Kensuke
Research Institute Of Electrical Communication Tohoku University
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Saito T
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Nakajima Kazuaki
Microelectronics Engineering Labs. Toshiba Corporation
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Saito T
School Of Engineering Nagoya University
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Inumiya Seiji
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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OZAWA Yoshio
Microelectronics Engineering Laboratory, Toshiba Corp.
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SAITO Tomohiro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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ARIKADO Tsunetoshi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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AKASAKA Yasushi
Microelectronics Engineering Laboratory, Toshiba Corp.
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Arikado T
Semiconductor Leading Edge Technologies Inc.
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Ozawa Yoshio
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Akasaka Yasushi
Microelectronics Engineering Laboratory Toshiba Corporation
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Arikado Tunetoshi
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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YANO Hiroyuki
Microelectronics Engineering Laboratory, Toshiba Corporation
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Yano H
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Hieda Katsuhiko
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Miyano K
Toshiba Corp. Yokohama Jpn
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TSUNASHIMA Yoshitaka
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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HOTTA Masaki
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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TSUNASHIMA Yoshitaka
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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MIYANO Kiyotaka
Microelectronics Engineering Laboratory, Toshiba Corp.
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OKUMURA Katsuya
Microelectronics Engineering Laboratory, Toshiba Corporation
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Tsunashima Y
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Tsunashima Yoshitaka
Microelectronics Engineering Laboratory Toshiba Corp.
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Hotta Masaki
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Nakamura S
Department Of Electrical And Electronic Engineering Yamaguchi University
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Iijima Tadashi
Microelectronics Engineering Lab. Toshiba Corporation
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Okumura Katsuya
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.:(present)university
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Miyano Kiyotaka
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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SHIMOOKA Yoshiaki
Microelectronics Engineering Lab., Toshiba Corporation
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NAKAMURA Shinichi
Environmental Engineering Labs., Toshiba Corporation
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Shimooka Yoshiaki
Microelectronics Engineering Lab. Toshiba Corporation
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Matsuo Kouji
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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TAKAHASHI Mamoru
Research and Development Center, Toshiba Corp.
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TANAKA Satoko
Semiconductor Group, Toshiba Corp.
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Toyoshima Yasutake
Electrotechnical Labotatory
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Toyoshima Yoshiaki
Semiconductor Device Engineering Laboratory Toshiba Corporation
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OHUCHI Kazuya
Microelectronics Engineering Laboratory, Toshiba Corporation
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MIYASHITA Katsura
Microelectronics Engineering Laboratory, Toshiba Corporation
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MURAKOSHI Atsushi
Microelectronics Engineering Laboratory, Toshiba Corporation
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YOSHIMURA Hisao
Microelectronics Engineering Laboratory, Toshiba Corporation
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TOYOSHIMA Yoshiaki
Microelectronics Engineering Laboratory, Toshiba Corporation
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Ouchi Kiyoshi
Central Research Laboratory Hitachi Ltd.
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Yoshimura Hisao
Microelectronics Engineering Laboratory Toshiba Corporation
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Miyashita K
Seiko Epson Corp. Nagano Jpn
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Matsuo K
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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NAKAMURA Shinichi
Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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MINAMIHABA Gaku
Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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MATSUO Kohji
Microelectronics Engineering Laboratory, Toshiba Corporation
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OMOTO Seiichi
Microelectronics Engineering Laboratory, Toshiba Corporation
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NAKAMURA Shinich
Microelectronics Engineering Laboratory, Toshiba Corporation
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MINAMIHABA Gaku
Microelectronics Engineering Laboratory, Toshiba Corporation
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Nakamura S
Univ. California California Usa
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Omoto Seiichi
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Minamihaba Gaku
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Murakoshi A
Toshiba Corp. Yokohama Jpn
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Takahashi Mamoru
Research And Development Center Toshiba Corp.
著作論文
- Sub-1.3 nm Amorphous Tantalum Pentoxide Gate Dielectrics for Damascene Metal Gate Transistors
- Sub 1.3nm Amorphous Ta_2O_5 Gate Dielectrics for Damascene Metal Gate Transistor
- Highly Uniform Low-Pressure Chemical Vapor Deposition (LP-CVD) of Si_3N_4 Film on Tungsten for Advanced Low-Resistivity "Polymetal" Gate Interconnects
- Plasma-Damage-Free Gate Process Using Chemical Mechanical Polishing for 0.1 μm MOSFETs
- Plasma Damage Free Gate Process Using CMP for 0.1um MOSFETs
- Improved Ti Self-Aligned Silicide Technology Using High Dose Ge Pre-Amorphization for 0.10 μm CMOS and Beyond
- Reliable High-k TiO_2 Gate Insulator Formed by Ultrathin TiN Deposition and Low Temperature Oxidation
- Highly Uniform Deposition of LP-CVD 3i3N4 Films on Tungsten for Advanced Low Resistivity "Poly-Metal" Gate Interconnects
- Correlation of W-Si-N Film Microstructure with Barrier Performance against Cu Diffusion
- Correlation of W-Si-N Film Microstructure with Barrier Performance against Cu Diffusion