Shimooka Yoshiaki | Microelectronics Engineering Lab. Toshiba Corporation
スポンサーリンク
概要
関連著者
-
Iijima Tadashi
Microelectronics Engineering Lab. Toshiba Corporation
-
Suguro K
Toshiba Corporation Semiconductor Company
-
SHIMOOKA Yoshiaki
Microelectronics Engineering Lab., Toshiba Corporation
-
Shimooka Yoshiaki
Microelectronics Engineering Lab. Toshiba Corporation
-
Suguro Kyoichi
Toshiba Corporation Semiconductor Company
-
SUGURO Kyoichi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
-
Nakamura S
Department Of Electrical And Electronic Engineering Yamaguchi University
-
NAKAMURA Shinichi
Environmental Engineering Labs., Toshiba Corporation
-
IIJIMA Tadashi
ULSI Research Laboratories, TOSHIBA Corporation
-
SHIMOOKA Yoshiaki
ULSI Research Laboratories, TOSHIBA Corporation
-
SUGURO Kyoichi
ULSI Research Laboratories, TOSHIBA Corporation
-
Suguro Kyoichi
Ulsi Research Center Toshiba Corporation
著作論文
- Correlation of W-Si-N Film Microstructure with Barrier Performance against Cu Diffusion
- Correlation of W-Si-N Film Microstructure with Barrier Performance against Cu Diffusion
- Inlaid Cu Interconnects Employing Ti-Si-N Barrier Metal for ULSI Applications