Correlation of W-Si-N Film Microstructure with Barrier Performance against Cu Diffusion
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概要
- 論文の詳細を見る
- 1996-08-26
著者
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SUGURO Kyoichi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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Nakamura S
Department Of Electrical And Electronic Engineering Yamaguchi University
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Iijima Tadashi
Microelectronics Engineering Lab. Toshiba Corporation
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Suguro K
Toshiba Corporation Semiconductor Company
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SHIMOOKA Yoshiaki
Microelectronics Engineering Lab., Toshiba Corporation
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NAKAMURA Shinichi
Environmental Engineering Labs., Toshiba Corporation
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Shimooka Yoshiaki
Microelectronics Engineering Lab. Toshiba Corporation
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Suguro Kyoichi
Toshiba Corporation Semiconductor Company
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