SHIMOOKA Yoshiaki | Microelectronics Engineering Lab., Toshiba Corporation
スポンサーリンク
概要
関連著者
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Iijima Tadashi
Microelectronics Engineering Lab. Toshiba Corporation
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Suguro K
Toshiba Corporation Semiconductor Company
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SHIMOOKA Yoshiaki
Microelectronics Engineering Lab., Toshiba Corporation
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Shimooka Yoshiaki
Microelectronics Engineering Lab. Toshiba Corporation
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Suguro Kyoichi
Toshiba Corporation Semiconductor Company
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SUGURO Kyoichi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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Nakamura S
Department Of Electrical And Electronic Engineering Yamaguchi University
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NAKAMURA Shinichi
Environmental Engineering Labs., Toshiba Corporation
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IIJIMA Tadashi
ULSI Research Laboratories, TOSHIBA Corporation
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SHIMOOKA Yoshiaki
ULSI Research Laboratories, TOSHIBA Corporation
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SUGURO Kyoichi
ULSI Research Laboratories, TOSHIBA Corporation
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Suguro Kyoichi
Ulsi Research Center Toshiba Corporation
著作論文
- Correlation of W-Si-N Film Microstructure with Barrier Performance against Cu Diffusion
- Correlation of W-Si-N Film Microstructure with Barrier Performance against Cu Diffusion
- Inlaid Cu Interconnects Employing Ti-Si-N Barrier Metal for ULSI Applications