Akasaka Yasushi | Microelectronics Engineering Laboratory Toshiba Corporation
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概要
関連著者
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Akasaka Yasushi
Microelectronics Engineering Laboratory Toshiba Corporation
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NAKAJIMA Kazuaki
Microelectronics Engineering Labs., Toshiba Corporation
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SUGURO Kyoichi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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AKASAKA Yasushi
Microelectronics Engineering Laboratory, Toshiba Corp.
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Nakajima Kensuke
Research Institute Of Electrical Communication Tohoku University
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Suguro K
Toshiba Corporation Semiconductor Company
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Yagishita A
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Nakajima Kazuaki
Microelectronics Engineering Labs. Toshiba Corporation
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Suguro Kyoichi
Toshiba Corporation Semiconductor Company
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Saito Tomohiro
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Saito T
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Saito T
School Of Engineering Nagoya University
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Hieda Katsuhiko
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Miyano K
Toshiba Corp. Yokohama Jpn
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Inumiya Seiji
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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OZAWA Yoshio
Microelectronics Engineering Laboratory, Toshiba Corp.
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YAGISHITA Atsushi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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SAITO Tomohiro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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ARIKADO Tsunetoshi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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MIYANO Kiyotaka
Microelectronics Engineering Laboratory, Toshiba Corp.
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YANO Hiroyuki
Microelectronics Engineering Laboratory, Toshiba Corporation
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OKUMURA Katsuya
Microelectronics Engineering Laboratory, Toshiba Corporation
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Arikado T
Semiconductor Leading Edge Technologies Inc.
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Ozawa Yoshio
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Yano H
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Okumura Katsuya
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.:(present)university
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Miyano Kiyotaka
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Arikado Tunetoshi
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Hishioka Kenji
Integrated Circuit Division Toshiba Corporation
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TAKAHASHI Mamoru
Research and Development Center, Toshiba Corp.
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TANAKA Satoko
Semiconductor Group, Toshiba Corp.
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USHIKU Yukihiro
Microelectronics Engineering Laboratories, Toshiba Corporation
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Nishiyama Akira
Ulsi Research Laboratories R & D Center Toshiba Corporation
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Takahashi Mamoru
Research And Development Center Toshiba Corp.
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Shiozaki Masakazu
Integrated Circuit Division, Toshiba Corporation, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan
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Akasaka Yasushi
Microelectronics Engineering Laboratory, Toshiba Corporation, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan
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Ushiku Yukihiro
Microelectronics Engineering Laboratory, Toshiba Corporation, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan
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Suizu Yasumasa
Microelectronics Engineering Laboratory, Toshiba Corporation, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan
著作論文
- Highly Uniform Low-Pressure Chemical Vapor Deposition (LP-CVD) of Si_3N_4 Film on Tungsten for Advanced Low-Resistivity "Polymetal" Gate Interconnects
- Plasma-Damage-Free Gate Process Using Chemical Mechanical Polishing for 0.1 μm MOSFETs
- Plasma Damage Free Gate Process Using CMP for 0.1um MOSFETs
- Highly Uniform Deposition of LP-CVD 3i3N4 Films on Tungsten for Advanced Low Resistivity "Poly-Metal" Gate Interconnects
- Agglomeration Resistant Self-Aligned Silicide Process Using N 2 Implantation into TiSi 2