Okumura Katsuya | Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.:(present)university
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概要
- OKUMURA Katsuyaの詳細を見る
- 同名の論文著者
- Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.:(present)universityの論文著者
関連著者
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Arikado T
Semiconductor Leading Edge Technologies Inc.
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Okumura Katsuya
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.:(present)university
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Arikado Tunetoshi
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Hieda Katsuhiko
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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ARIKADO Tsunetoshi
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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ARIKADO Tsunetoshi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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OKUMURA Katsuya
Microelectronics Engineering Laboratory, Toshiba Corporation
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Yoshioka Masahiro
NMIJ AIST
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Nakajima Kensuke
Research Institute Of Electrical Communication Tohoku University
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Yoshioka Masakazu
Kek National Laboratory For High Energy Physics
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Suguro K
Toshiba Corporation Semiconductor Company
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YOSHIOKA Masaki
Lamp Technology & Engineering Division, Ushio Inc.
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OWADA Tatsushi
Lamp Technology & Engineering Division, Ushio Inc.
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Owada Tatsushi
Lamp Technology And Engineering Division Ushio Inc.
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Suguro Kyoichi
Toshiba Corporation Semiconductor Company
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Arikado Tsunetoshi
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Saito Tomohiro
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Inumiya Seiji
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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NAKAJIMA Kazuaki
Microelectronics Engineering Labs., Toshiba Corporation
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OZAWA Yoshio
Microelectronics Engineering Laboratory, Toshiba Corp.
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YAGISHITA Atsushi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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SAITO Tomohiro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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SUGURO Kyoichi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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AKASAKA Yasushi
Microelectronics Engineering Laboratory, Toshiba Corp.
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YANO Hiroyuki
Microelectronics Engineering Laboratory, Toshiba Corporation
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Imai Keitaro
Feram Development Alliance Semiconductor Company Toshiba Corp.
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Imai Keitaro
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Saito T
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Ozawa Yoshio
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Yano H
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Yamakawa K
Japan Atomic Energy Agency
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OKUMURA Katsuya
Process & Manufacturing Engineering Center, Semiconductor Company Toshiba Corporation
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YAMAKAWA Koji
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
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ARISUMI Osamu
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
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Arisumi Osamu
Feram Development Alliance Semiconductor Company Toshiba Corp.
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Okumura Katsuya
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Yagishita A
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Yamakawa K
Advanced Photon Research Center Kansai Research Establishment Japan Atomic Energy Research Institute
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Yamakawa K
Department Of Quantum Engineering Nagoya University
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Akasaka Yasushi
Microelectronics Engineering Laboratory Toshiba Corporation
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Nakajima Kazuaki
Microelectronics Engineering Labs. Toshiba Corporation
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Saito T
School Of Engineering Nagoya University
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Imai Keitaro
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
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Aoyama T
Toshiba Corp. Yokohama Jpn
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Aoyama T
Hitachi Ltc. Ibaraki Jpn
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Aoyama Tomonori
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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MURAKOSHI Atsushi
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
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SUGURO Kyoichi
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
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KIYOTOSHI Masahiro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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IZUHA Mitsuaki
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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EGUCHI Kazuhiro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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NAKAHIRA Junya
Technology Development Division, Semiconductor Group, Fujitsu Limited
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NAKABAYASHI Masaaki
Technology Development Division, Semiconductor Group, Fujitsu Limited
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YAMAZAKI Soichi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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TSUNODA Kohji
Fujitsu Laboratories Limited
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LIN Jun
Technology Development Division, Semiconductor Group, Fujitsu Limited
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NAKAMURA Kenro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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NIWA Syoko
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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TOMITA Hiroshi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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SHIMADA Akihiro
Technology Development Division, Semiconductor Group, Fujitsu Limited
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KOHYAMA Yusuke
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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ISHIBASHI Yutaka
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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FUKUZUMI Yoshiaki
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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IMAOKA Yasuhiro
Development Department, Dainippon Screen Manufacturing Co., Ltd.
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Niwa Shoko
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Kohyama Yusuke
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Suguro Kyoichi
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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OKUMURA Katsuya
Research Center for Advanced Science and Technology, The University of Tokyo
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Imaoka Yasuhiro
Development Department For Electronics Equipment Dainippon Screen Mfg. Co. Ltd.
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AKUTSU Haruko
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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IINUMA Toshihiko
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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Izuha Mitsuaki
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Murayama Hiromi
Development Department For Electronics Equipment Dainippon Screen Mfg. Co. Ltd.
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Lin Jun
Technology Development Division Semiconductor Group Fujitsu Limited
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Nakahira Junya
Technology Development Division Semiconductor Group Fujitsu Limited
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Yamazaki S
Toshiba Corp. Yokohama Jpn
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Shimada Akihiro
Technology Development Division Semiconductor Group Fujitsu Limited
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Eguchi K
Tokyo Metropolitan Univ. Tokyo Jpn
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ITO Takayuki
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
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KUSUDA Tatsuhumi
Development Department for Electronics Equipment, Dainippon Screen Mfg. Co. Ltd.
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Akutsu Haruko
Toshiba Corporation Semiconductor Company
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Iinuma Toshihiko
Toshiba Corporation Semiconductor Company
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Kusuda Tatsuhumi
Development Department For Electronics Equipment Dainippon Screen Mfg. Co. Ltd.
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Murakoshi Atsushi
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Kiyotoshi Masahiro
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Ito Takayuki
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Fukuzumi Yoshiaki
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Nakabayashi Masaaki
Technology Development Division Semiconductor Group Fujitsu Limited
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Ishibashi Yutaka
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Tomita Hiroshi
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Murakoshi Atsushi
Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
著作論文
- Plasma-Damage-Free Gate Process Using Chemical Mechanical Polishing for 0.1 μm MOSFETs
- Plasma Damage Free Gate Process Using CMP for 0.1um MOSFETs
- (Ba, Sr)TiO_3 Stacked Capacitor Technology for 0.13μm-DRAMs and Beyond
- Novel Pb(Ti,Zr)O_3(PZT) Crystallization Technique Using Flash Lamp for Ferroelectric RAM (FeRAM) Embedded LSIs and One Transistor Type FeRAM Devices
- Novel PZT Crystallization Technique by Using Flash Lamp for FeRAM Embedded LSIs and 1Tr FeRAM Devices
- 10-15nm Ultrashallow Junction Formation by Flash-Lamp Annealing