YAGISHITA Atsushi | Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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概要
関連著者
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YAGISHITA Atsushi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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Yagishita A
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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SAITO Tomohiro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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Saito T
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Saito T
School Of Engineering Nagoya University
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SUGURO Kyoichi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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Suguro K
Toshiba Corporation Semiconductor Company
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Suguro Kyoichi
Toshiba Corporation Semiconductor Company
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Saito Tomohiro
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Inumiya Seiji
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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OZAWA Yoshio
Microelectronics Engineering Laboratory, Toshiba Corp.
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ARIKADO Tsunetoshi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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Arikado T
Semiconductor Leading Edge Technologies Inc.
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Ozawa Yoshio
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Arikado Tunetoshi
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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NAKAJIMA Kazuaki
Microelectronics Engineering Labs., Toshiba Corporation
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YANO Hiroyuki
Microelectronics Engineering Laboratory, Toshiba Corporation
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Nakajima Kensuke
Research Institute Of Electrical Communication Tohoku University
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Yano H
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Nakajima Kazuaki
Microelectronics Engineering Labs. Toshiba Corporation
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Hieda Katsuhiko
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Matsuda Satoru
The Institute Of Scientific And Industrial Research Osaka University
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Matsuda S‐p
Hitachi Research Laboratory Hitachi Ltd.
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Matsuda Shimpei
Hitachi Research Laboratory Of Hitachi Ltd.
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TSUNASHIMA Yoshitaka
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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HOTTA Masaki
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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TSUNASHIMA Yoshitaka
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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AKASAKA Yasushi
Microelectronics Engineering Laboratory, Toshiba Corp.
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OKUMURA Katsuya
Microelectronics Engineering Laboratory, Toshiba Corporation
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Matsuda Seisuke
Faculty Of Technology Tokyo Universily Of Agriculture And Technology:(present Address) Olympus Optic
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MATSUDA Satoshi
Microelectronics Engineering Laboratories, Toshiba Corporation
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USHIKU Yukihiro
Microelectronics Engineering Laboratories, Toshiba Corporation
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Tsunashima Y
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Tsunashima Yoshitaka
Microelectronics Engineering Laboratory Toshiba Corp.
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Hotta Masaki
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Ushiku Y
Advanced Semiconductor Devices Research Laboratories Toshiba Corporation
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Okumura Katsuya
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.:(present)university
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Akasaka Yasushi
Microelectronics Engineering Laboratory Toshiba Corporation
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Matsuo Kouji
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Matsuo K
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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NAKAMURA Shinichi
Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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MINAMIHABA Gaku
Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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MATSUO Kohji
Microelectronics Engineering Laboratory, Toshiba Corporation
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OMOTO Seiichi
Microelectronics Engineering Laboratory, Toshiba Corporation
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NAKAMURA Shinich
Microelectronics Engineering Laboratory, Toshiba Corporation
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MINAMIHABA Gaku
Microelectronics Engineering Laboratory, Toshiba Corporation
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Nakamura S
Univ. California California Usa
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Omoto Seiichi
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Minamihaba Gaku
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
著作論文
- Sub-1.3 nm Amorphous Tantalum Pentoxide Gate Dielectrics for Damascene Metal Gate Transistors
- Sub 1.3nm Amorphous Ta_2O_5 Gate Dielectrics for Damascene Metal Gate Transistor
- Plasma-Damage-Free Gate Process Using Chemical Mechanical Polishing for 0.1 μm MOSFETs
- Plasma Damage Free Gate Process Using CMP for 0.1um MOSFETs
- Effects of Cleavage on Local Cross-Sectional Stress Distribution in Trench Isolation Structure
- Effects of Cleavage on Local Cross-Sectional Stress Distribution in Trench Isolation Structure
- Reliable High-k TiO_2 Gate Insulator Formed by Ultrathin TiN Deposition and Low Temperature Oxidation