Effects of Cleavage on Local Cross-Sectional Stress Distribution in Trench Isolation Structure

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-03-30

著者

• Matsuda Satoru

  The Institute Of Scientific And Industrial Research Osaka University

• Matsuda S‐p

  Hitachi Research Laboratory Hitachi Ltd.

• Matsuda Shimpei

  Hitachi Research Laboratory Of Hitachi Ltd.

• YAGISHITA Atsushi

  Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation

• SAITO Tomohiro

  Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation

• Matsuda Seisuke

  Faculty Of Technology Tokyo Universily Of Agriculture And Technology:(present Address) Olympus Optic

• Saito T

  Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.

• MATSUDA Satoshi

  Microelectronics Engineering Laboratories, Toshiba Corporation

• USHIKU Yukihiro

  Microelectronics Engineering Laboratories, Toshiba Corporation

• Ushiku Y

  Advanced Semiconductor Devices Research Laboratories Toshiba Corporation

• Yagishita A

  Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation

• Saito T

  School Of Engineering Nagoya University

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