Structural Properties of Amorphous Carbon Nitride Films Prepared by Reactive RF-Magnetron Sputtering

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-10-01

著者

• Nagata Shoichi

  Dep. Of Materials Sci. And Engineering Muroran Inst. Of Technol. 27-1 Mizumoto-cho Muroran Hokkaido

• Nagata Shoichi

  Muroran Inst. Technol. Hokkaido Jpn

• Nagata S

  Osaka Univ.

• Kosuge Koji

  Department Of Chemistry Faculty Of Science Kyoto University

• Kosuge K

  Division Of Chemistry Graduate School Of Science Kyoto University

• Kosuge Koji

  Department Of Chemistry Kyoto University

• NAGATA Shinji

  Institute for Chemical Research, Kyoto University

• TSUCHIYA Yasuaki

  Department of Chemistry, Faculty of Science, Kyoto University

• NAKAYAMA Noriaki

  Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi Universi

• YAMAGUCHI Sadae

  Institute for Materials Research, Tohoku University

• Takahiro Katsumi

  Institute for Materials Research, Tohoku University

• TSUCHIYA Yasuaki

  Division of Chemistry, Graduate School of Science, Kyoto University

• TAMADA Satoru

  Department of Chemistry, Faculty of Science, Kyoto University

• KOSUGE Kouji

  Department of Chemistry, Faculty of Science, Kyoto University

• Nakayama Noriaki

  Fujitsu Laboratories Ltd.

• Nakayama Noriaki

  Semiconductor Technology Academic Research Center (starc)

• Nakayama Noriaki

  Department Of Advanced Materials Science And Engineering Faculty Of Engineering

• Yamaguchi Sadaei

  Institute For Materials Research Tohoku University

• Saito T

  Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.

• Nagata S

  Tohoku University

• Nasu Shoichi

  Kanazawa Institute Of Technology

• Takahiro K

  Tohoku University

• Takahiro Katsumi

  Institute For Materials Research Tohoku University

• Takahiro Katsumi

  Department Of Electrical Engineering Hiroshima University

• Yamaguchi Sadae

  Institute For Materials Research Tohoku University

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