Novel PZT Crystallization Technique by Using Flash Lamp for FeRAM Embedded LSIs and 1Tr FeRAM Devices
スポンサーリンク
概要
- 論文の詳細を見る
- 2001-09-25
著者
-
ARIKADO Tsunetoshi
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
-
Yoshioka Masahiro
NMIJ AIST
-
Yoshioka Masakazu
Kek National Laboratory For High Energy Physics
-
Imai Keitaro
Feram Development Alliance Semiconductor Company Toshiba Corp.
-
Imai Keitaro
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
-
Arikado T
Semiconductor Leading Edge Technologies Inc.
-
Yamakawa K
Japan Atomic Energy Agency
-
OKUMURA Katsuya
Process & Manufacturing Engineering Center, Semiconductor Company Toshiba Corporation
-
YAMAKAWA Koji
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
-
ARISUMI Osamu
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
-
YOSHIOKA Masaki
Lamp Technology & Engineering Division, Ushio Inc.
-
OWADA Tatsushi
Lamp Technology & Engineering Division, Ushio Inc.
-
Arisumi Osamu
Feram Development Alliance Semiconductor Company Toshiba Corp.
-
Owada Tatsushi
Lamp Technology And Engineering Division Ushio Inc.
-
Okumura Katsuya
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.:(present)university
-
Okumura Katsuya
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
-
Yamakawa K
Advanced Photon Research Center Kansai Research Establishment Japan Atomic Energy Research Institute
-
Yamakawa K
Department Of Quantum Engineering Nagoya University
-
Arikado Tunetoshi
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
-
Arikado Tsunetoshi
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
-
Imai Keitaro
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
関連論文
- Growth of Carbon Nanotubes by Microwave-excited Non-Equilibrium Atmospheric-Pressure Plasma
- Diamond Film Formation by OH Radical Injection from Remote Microwave H_2/H_2O Plasma into Parallel-Plate RF Methanol Plasma
- Synthesis of Diamond Using RF Magnetron Methanol Plasma Chemical Vapor Deposition Assisted by Hydrogen Radical Injection
- Defects Induced by Carbon Contamination in Low-Temperature Epitaxial Silicon Films Grown with Monosilane
- Peak Intensity Enhancement and Pulse Compression of a Picosecond Laser Pulse by Frequency Doubling with a Predelay
- Surface Channel Metal Gate Complementary MOS with Light Counter Doping and Single Work Function Gate Electrode
- Sub-1.3 nm Amorphous Tantalum Pentoxide Gate Dielectrics for Damascene Metal Gate Transistors
- Sub 1.3nm Amorphous Ta_2O_5 Gate Dielectrics for Damascene Metal Gate Transistor
- Plasma-Damage-Free Gate Process Using Chemical Mechanical Polishing for 0.1 μm MOSFETs
- Plasma Damage Free Gate Process Using CMP for 0.1um MOSFETs
- Influence of Lattice Distortion and Oxygen Defects in BST Films for Memory Capacitors
- (Ba, Sr)TiO_3 Stacked Capacitor Technology for 0.13μm-DRAMs and Beyond
- Quantum-efficiency Dependence of the Spin Polarization of Photoemission from a GaAs-AlGaAs Superlattice
- Proposed Method to Produce a Highly Polarized e^+ Beam for Future Linear Colliders
- A High Polarization and High Quantum Efficiency Photocathode Using a GaAs -AlGaAs Superlattice
- Highly Polarized Electron Source Using InGaAs-GaAs Strained-Layer Superlattice
- P3-8 Calibration of Hydrophone Sensitivity Using Planar Scanning Method : Effect of Nonlinear Propagation(Poster session 3)
- Ultrasonic Power Measurement by the Radiation Force Balance Method : Experimental Results using Burst Waves and Continuous Waves (Short Note)
- Degenerate Optical Parametric Chirped-Pulse Amplifier Pumped by an Yb:YLF Chirped-Pulse Amplification Laser
- Synthesis and Some Spectroscopic Properties of Porphyrin Derivatives Connected with Nucleobases (Adenine, Thymine, Guanine and Cytosine)by Alkanamide Chains
- Porphyrins Coupled with Nucleoside Bases. Synthesis and Characterization of Ether-Linked Adenine-Thymine and Guanine-Cytosine Derivatives
- New Charge Control Technology by Stencil Mask Ion Implantation
- Idler Pulse Compression using an Identical Positive Stretcher/Compressor Combination in Optical-Parametric Chirped-Pulse Amplification
- Lead Content Control in (Pb, La) (Zr, Ti)O_3 Films Using Ar/O_2 Sequential Rapid Thermal Process
- Optical Field Ionization of Rare Gas Atoms by > 10^W/cm^2,10-Hz Laser Pulses
- Novel Pb(Ti,Zr)O_3(PZT) Crystallization Technique Using Flash Lamp for Ferroelectric RAM (FeRAM) Embedded LSIs and One Transistor Type FeRAM Devices
- Suppression of Cubic Nonlinearity in Second-Harmonic Generation of Ultrahigh-Intensity Laser Pulses by Initial Frequency Chirp(Optics and Quantum Electronics)
- Compensation for Third-Order Nonlinearity with Initial Phase Mismatch in Second-Harlnonic Generation of Ultrahigh Intensity Laser Pulses : Optics and Quantum Electronics
- A Simulation Code for Tempo-Spatial Analysis of Three-Wave Interaction with Ultrashort- and Ultrahigh-Intensity Laser Pulses : Optics and Quantum Electronics
- Novel PZT Crystallization Technique by Using Flash Lamp for FeRAM Embedded LSIs and 1Tr FeRAM Devices
- Noncollinear Second-Harmonic Generation with Compensation of Phase Mismatch by Controlling Frequency Chirp and Tilted Pulse Fronts of Femtosecond Laser Pulses
- Efficient Noncollinear Second-Harmonic Generation with Proper Frequency Chirp and Tilted Pulse Fronts of Femtosecond Laser Pulses
- Noncollinear Chirp-Compensated Second-Harmonic Generation with Subpicosecond Laser Pulses
- Generation of a 0.55-PW,33-fs Laser Pulse from a Ti : sapphire Laser System
- Analysis of Si-Ge Source Structure in 0.15 μm SOI MOSFETs Using Two-Dimensional Device Simulation
- Analysis of Si-Ge Source Structure in 0.15μm SOI MOSFETs Using Two-Dimensional Device Simulation
- Low Pressure High Speed Spin Dryer for Realizing Water Mark Free Surface
- Ferroelectric Properties of Pb(Zi, Ti)O_3 Capacitor with Thin SrRuO_3 Films within Both Electrodes
- Performances of Novel Nozzle-Scan Coating Method
- Optical Measurement of Sound Fields Information Using Mach-Zehnder Interferometer
- CORROSION BEHAVIOR AND HYDROGEN CONTENT OF CARBON STEELS IN CO_2 ENVIRONMENT
- Microbial Hydroxylation of 11,13-Dehydrosantonin by Aspergillus niger : Studies on Microbiological Transformation (XXVIII).
- Microbial Hydroxylation of (-)-α-Santonin by Aspergillus niger : Studies on Microbial Transformations(XXIV)
- Accuracy of Overlay Metrology with Nonp-enetrating and Negative-Charging Electron Beam of the Scanning Electron Microscope
- Influence of Al Surface Modification on Selectivity in Via-Hole Etching Employing CHF_3 Plasma
- 10-15nm Ultrashallow Junction Formation by Flash-Lamp Annealing
- Measurement of Fine-Particle-Velocity under Spatial Frequency Domain Using a Fourier Transform Spectrometer
- Composition Control of Barium Strontium Titanate Thin Films Prepared by Chemical Vapor Deposition
- SiO_2 Tapered Etching Employing Magnetron Discharge of Fluorocarbon Gas
- Single Silicon Etching Profile Simulation
- Characteristics of(Ba, Sr)TiO_3 Capacitors with Textured Ru Bottom Electrode
- Measurement of Two-Dimensional Temperature Distribution in Water Using Acoustooptic Interaction
- Defects Induced by Carbon Contamination in Low-Temperature Epitaxial Silicon Films Grown with Monosilane
- Tomographic Data Collection of Sonic Fields Using Laser Diffraction
- Sonic Field Measurement Using Light Computerized Tomography
- Lead Content Control in (Pb, La)(Zr, Ti)O3 Films Using Ar/O2 Sequential Rapid Thermal Process
- Surface Channel Metal Gate Complementary MOS with Light Counter Doping and Single Work Function Gate Electrode