Lead Content Control in (Pb, La) (Zr, Ti)O_3 Films Using Ar/O_2 Sequential Rapid Thermal Process
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-02-15
著者
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NAKAMURA Shin-ichi
TOSHIBA CORPORATION Research and Development Center
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Imai Keitaro
Feram Development Alliance Semiconductor Company Toshiba Corp.
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Yamakawa K
Japan Atomic Energy Agency
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ARISUMI Osamu
FeRAM Development Alliance, Semiconductor Company, Toshiba Corp.
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MOON Bum-Ki
FeRAM Development Alliance, Infineon Technologies
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YAMAKAWA Koji
FeRAM Development Alliance, Semiconductor Company, Toshiba Corp.
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Yamakawa K
Department Of Quantum Engineering Nagoya University
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