OHUCHI Kazuya | Microelectronics Engineering Laboratory, Toshiba Corporation

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概要

• 同名の論文著者
• Microelectronics Engineering Laboratory, Toshiba Corporationの論文著者

関連著者

• OHUCHI Kazuya

  Microelectronics Engineering Laboratory, Toshiba Corporation

• Miyano K

  Toshiba Corp. Yokohama Jpn

• MIZUSHIMA Ichiro

  Microelectronics Engineering Laboratory, Toshiba Corp.

• SUGURO Kyoichi

  Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation

• MIYANO Kiyotaka

  Microelectronics Engineering Laboratory, Toshiba Corp.

• Toyoshima Yasutake

  Electrotechnical Labotatory

• Toyoshima Yoshiaki

  Semiconductor Device Engineering Laboratory Toshiba Corporation

• Mizushima I

  Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation

• Mizushima Ichiro

  Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation

• MIYASHITA Katsura

  Microelectronics Engineering Laboratory, Toshiba Corporation

• MURAKOSHI Atsushi

  Microelectronics Engineering Laboratory, Toshiba Corporation

• YOSHIMURA Hisao

  Microelectronics Engineering Laboratory, Toshiba Corporation

• TOYOSHIMA Yoshiaki

  Microelectronics Engineering Laboratory, Toshiba Corporation

• Ohuchi Kimihiro

  System Lsi Research & Development Center Semiconductor Company Toshiba Corporation

• Ouchi Kiyoshi

  Central Research Laboratory Hitachi Ltd.

• Hokazono A

  Toshiba Corp. Kanagawa Jpn

• Ohiwa Tokuhisa

  Microelectronics Engineering Laboratory Toshiba Corporation Semiconductor Company

• Suguro K

  Toshiba Corporation Semiconductor Company

• Yoshimura Hisao

  Microelectronics Engineering Laboratory Toshiba Corporation

• Miyashita K

  Seiko Epson Corp. Nagano Jpn

• HAYASHI Hisataka

  Microelectronics Engineering Laboratory, Toshiba Corporation Semiconductor Company

• HOKAZONO Akira

  Microelectronics Engineering Laboratory, Toshiba Corporation Semiconductor Company

• Miyano Kiyotaka

  Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation

• Hayashi Hisataka

  Microelectronics Engineering Laboratory Toshiba Corporation Semiconductor Company

• Hayashi Hisataka

  Microelectronics Engineering Lab. Toshiba Corporation

• Murakoshi A

  Toshiba Corp. Yokohama Jpn

• Suguro Kyoichi

  Toshiba Corporation Semiconductor Company

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著作論文

• Improved Ti Self-Aligned Silicide Technology Using High Dose Ge Pre-Amorphization for 0.10 μm CMOS and Beyond
• Influence of Reactive Ion Etching Applied to Si Substrate on Epitaxial Si Growth and Its Removal

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