Measurements of Diffusion Coefficient of CF_2 Radical in DC Pulsed CF_4/O_2 Discharge Plasma (<Special Issue> Plasma Processing)
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-07-30
著者
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後藤 誠
北陸職業能力開発大学校
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Murakami M
Department Of Electrical And Electronic Engineering Kanagawa Institute Of Technology
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ARAI Toshihiko
Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
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GOTO Miki
Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
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MURAKAMI Masahiko
Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology
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TAKAYAMA Daisuke
Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology
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SHIMIZU Tetsuya
Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology
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Goto M
Matsushita Electric Industrial Co.
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Arai Takeshi
The Faculty Of Engineering Saitama University
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GOTO Masashi
Matsushita Electric Industrial Co.
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Murakami Masahiko
Department Of Chemical Engineering Tohoku University
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新井 豊子
金大院自然
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Goto Miki
Department Of Electrical And Electronic Engineering Kanagawa Institute Of Technology
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Arai Toshihiko
Department Of Electrical And Electronic Engineering Kanagawa Institute Of Technology
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Shimizu T
Chiba Univ. Chiba Jpn
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Takayama Daisuke
Toshiba Lighting & Technology Corporation
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Takayama Daisuke
Department Of Chemistry Graduate School Of Science Tohoku University
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