Hydrogen Incorporation Scheme in Amorphous-Microcrystalline Mixed-Phase Si: H Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1983-03-20

著者

• Ueda Shigenori

  Department Of Material Physics Graduate School Of Engineering Science Osaka University

• SHIMIZU Tatsuo

  Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazawa University

• KUMEDA Minoru

  Department of Electronics, Faculty of Technology, Kanazawa University

• UEDA SHOICHI

  Department of Urology, Kumamoto University

• NAKAZAWA Kenji

  Department of Internal Medicine, Saiseikai Utsunomiya Hospital

• Kumeda M

  Kanazawa Univ. Kanazawa Jpn

• Ueda K

  Department Of Electrical And Computer Engineering Faculty Of Engineering Kanazawa University

• Ueda Shoichi

  Department Of Electronics Faculty Of Technology Kanazawa University

• Kumeda Minoru

  Department Of Electrical And Computer Engineering Faculty Of Engineering Kanazawa University

• Nakazawa Kenji

  Department Of Electronics Faculty Of Technology Kanazawa University

• YONEZAWA Yasuto

  Department of Electrical and Computer Engineering, Kanazawa University

• Shimizu T

  Chiba Univ. Chiba Jpn

• Yonezawa Y

  Industrial Research Institute Of Ishikawa

• Shimizu Tatsuo

  Department Of Applied Physics University Of Tokyo

• Kumeda Minoru

  Department of Electric and Electronic Engineering. Kanazawa University

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