Structure of Films Prepared by Glow Discharge Decomposition of Hexafluorodisilane
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概要
- 論文の詳細を見る
The structure of films prepared by the glow discharge decomposition of hexafluorodisilane (Si_2F_6) gas was investigated. Such films are considered to be predominantly an admixture of a (SiF_2)_η chain and a SiO_2 cluster with a small interface region of hydrogenated amorphous Si.
- 社団法人応用物理学会の論文
- 1986-12-20
著者
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TAKAHASHI Yukio
Department of Applied and Environmental Chemistry, Kitami Institute of Technology
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SHIMIZU Tatsuo
Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazawa University
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KUMEDA Minoru
Department of Electronics, Faculty of Technology, Kanazawa University
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Kumeda Minoru
Department Of Electrical And Computer Engineering Faculty Of Engineering Kanazawa University
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Takahashi Yukio
Department Of Applied And Environmental Chemistry Kitami Institute Of Technology
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Shimizu Tatsuo
Department Of Applied Physics University Of Tokyo
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Takahashi Yukio
Department Of Electronics Faculty Of Technology Kanazawa University
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