Mechanism of Stoichiometric Deposition of Volatile Elements in Multimetal-Oxide Films Prepared by Pulsed Laser Ablation

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1996-02-15

著者

• MASUDA Atsushi

  Department of Pathology and Cell Regulation, Kyoto Prefectural University of Medicine

• MASUDA Atsushi

  Japan Advanced Institute of Science and Technology

• YONEZAWA Yasuto

  Industrial Research Institute of Ishikawa (IRII)

• MORIMOTO Akiharu

  Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazawa University

• SHIMIZU Tatsuo

  Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazawa University

• MATSUDA Kazuko

  Department of Pediatrics, Sapporo Medical University School of Medicine

• Matsuda Kazuko

  Faculty Of Engineering Kanazawa University

• Shimizu T

  Univ. Occupational And Environmental Health Jpn

• Matsuda K

  Univ. Cambridge Cambridge Gbr

• Moto A

  Department Of Electrical And Electronic Engineering Kanazawa University

• Shimizu Tadao

  Department Of Physics University Of Tokyo

• Shimizu T

  Department Of Electrical And Electronic Engineering Kanazawa University

• Matsuda K

  Waseda Univ. Tokyo Jpn

• Matsuda Kazuko

  Department Of Pediatrics Sapporo Medical University School Of Medicine

• Masuda A

  Japan Advanced Institute Of Science And Technology

• Shimizu T

  Chiba Univ. Chiba Jpn

• Moto Akihiro

  The Authors Are With The Research Center For Superconductor Photonics Osaka University

• Yonezawa Y

  Industrial Research Institute Of Ishikawa

• Yonezawa Yasuto

  Industrial Research Institute Of Ishikawa

• Masuda Atsushi

  Department Of Neurosurgery Shimizu Hospital

• Shimizu Tatsuo

  Department Of Applied Physics University Of Tokyo

• Masuda Atsushi

  Department Of Neurosurgery Eisyokai Yoshida Hospital

• Masuda Atsushi

  Department of Electrical and Computer Engineering, Faculty of Engineering,

• Morimoto Akiharu

  Department of Electrical and Computer Engineering, Faculty of Engineering,

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