Moisture-Resistive Properties of SiN_x Films Prepared by Catalytic Chemical Vapor Deposition below 100℃ for Flexible Organic Light-Emitting Diode Displays
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-04-15
著者
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Matsumura Hideki
Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn
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Nakamura T
National Defense Acad. Kanagawa Jpn
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MASUDA Atsushi
Japan Advanced Institute of Science and Technology
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TAKANO Masahiro
Industrial Research Institute of Ishikawa (IRII)
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NIKI Toshikazu
Japan Science and Technology Agency (JST)
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HEYA Akira
Industrial Research Institute of Ishikawa (IRII)
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YONEZAWA Yasuto
Industrial Research Institute of Ishikawa (IRII)
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MINAMIKAWA Toshiharu
Industrial Research Institute of Ishikawa (IRII)
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MUROI Susumu
Ishikawa Seisakusho, Ltd.
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MINAMI Shigehira
Ishikawa Seisakusho, Ltd.
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UMEMOTO Hironobu
Japan Advanced Institute of Science and Technology (JAIST)
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IZUMI Akira
Japan Advanced Institute of Science and Technology (JAIST)
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IKARI Tokuo
Kuraray Co., Ltd.
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HEYA Akira
JAIST(Japan Advanced Institute of Science and Technology)
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Niki Toshikazu
Ishikawa Seisakusho Ltd.
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