Low-Resistivity Phosphorus-Doped Polycrystalline Silicon Thin Films Formed by Catalytic Chemical Vapor Deposition and Successive Rapid Thermal Annealing
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-02-15
著者
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Morimoto Rui
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Morimoto Rui
School Of Materials Science Japan Advanced Institute Of Science And Technokogy (jaist)
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Matsumura Hideki
Japan Advanced Inst. Sci. And Technol. (jaist) Ishikawa Jpn
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MASUDA Atsushi
Japan Advanced Institute of Science and Technology
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IZUMI Akira
Japan Advanced Institute of Science and Technology (JAIST)
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MASUDA Atsushi
School of Materials Science, Japan Advanced Institute of Science and Technology
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MATSUMURA Hideki
School of Materials Science, Japan Advanced Institute of Science and Technology
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IZUMI Akira
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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Matsumura Hideki
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Matsumura Hideki
School Of Materials Science Jaist (japan Advanced Institute Of Science And Technology)
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Izumi A
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Masuda A
Japan Advanced Institute Of Science And Technology
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Masuda Atsushi
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Matsumura Hideki
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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Masuda Atsushi
School of Material Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Matsumura Hideki
School of Material Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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