A Comparison of the Thermal Stabilities of Fluorinated and Hydrogenated Amorphous-Silicons
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1980-02-05
著者
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Matsumura Hideki
Department Of Applied Electronics Tokyo Institute Of Technology
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FURUKAWA Seijiro
Department of Physical Electronics, Faculty of Engineering, Tokyo Institute of Technology
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NAKAGOME Yoshinobu
Department of Applied Electronics, Tokyo Institute of Technology
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Nakagome Yoshinobu
Department Of Applied Electronics Tokyo Institute Of Technology
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Furukawa Seijiro
Department Of Applied Electronics Tokyo Institute Of Technology
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Furukawa Seijiro
Department Of Applied Electronics Interdisciplinary Graduate School Of Science And Engineering Tokyo
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Furukawa Seijiro
Department Of Applied Electronics Graduate School Of Science And Technology
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Matsumura Hideki
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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MATSUMURA Hideki
Department of Applied Electronics, Tokyo Institute of Technology
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