Dependency of Boron Doping Efficiency on Hydrogen Flow Rate in Hydro-Fluorinated Amorphous Silicon
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1986-09-20
著者
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Matsumura H
Japan Advanced Inst. Of Sci. And Technol. (jaist) Ishikawa Jpn
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Matsumura H
Japan Advanced Inst. Sci. And Technol. Ishikawa Jpn
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Uesugi T
Waseda Univ. Tokyo Jpn
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UESUGI TAKASHI
Department of Biopharmacy, Meiji College of Pharmacy
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Matsumura Hideki
Department Of Applied Electronics Tokyo Institute Of Technology
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IHARA Hisanori
Department of Physical Electronics, Hiroshima University
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Ihara H
Toshiba Research & Development Center Toshiba Corporation
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Uesugi Takashi
Department Of Biopharmacy Meiji Coll. Of Pharmacy
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Matsumura Hideki
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
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