Low Temperature Deposition of Silicon Nitride by the Catalytic Chemical Vapor Deposition Method : Etching and Deposition Technology
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-12-30
著者
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Matsumura Hideki
Department Of Applied Electronics Tokyo Institute Of Technology
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Matsumura Hideki
Department Of Physical Electronics Hitoshima University
関連論文
- Theoretical Considerations on Lateral Spread of Implanted Ions
- Dependency of Boron Doping Efficiency on Hydrogen Flow Rate in Hydro-Fluorinated Amorphous Silicon
- Properties of Hydro-Fluorinated Amorphous Silicon-Carbide Produced by Intermediate Species SiF_2
- The Staebler-Wronski Effect in Hydro-Fluorinated Amorphous Silicon Prepared Using the Intermediate Species SiF_2
- Photoconductive Amorphous Silicon-Carbide Produced by Intermediate Species SiF_2 and CF_4 Mixture
- An Amorphous-Silicon Film Usable at High-Temperature : Annealing Properties of a New Fluorinated Amorphous-Silicon : II-2: AMORPHOUS FILM PREPARATION AND CHARACTERIZATION (II)
- A Comparison of the Thermal Stabilities of Fluorinated and Hydrogenated Amorphous-Silicons
- Optically Detected Magnetic Resonance in Fluorinated Amorphous Silicon (a-Si:F, a-Si:F, H and a-Si:F, D)
- Photoluminescence of a-Si:H Films Prepared by Catalytic Chemical Vapor Deposition Method
- Photo-Conductive, Low Impurity-Diffusive, Heat-Resisting a-Si Formed by Glow-Discharged Decomposition of SiF_2 and H_2 Mixture : C-5: SOLAR CELLS
- Formation of Polysilicon Films by Catalytic Chemical Vapor Deposition (cat-CVD) Method
- Theoretical Considerations in Lateral Damage Distribution Formed by Ion-Implantation
- Low Temperature Deposition of Silicon Nitride by the Catalytic Chemical Vapor Deposition Method : Etching and Deposition Technology
- Catalytic Chemical Vapor Deposition (CTC-CVD) Method Producing High Quality Hydrogenated Amorphous Silicon
- A New X-Ray Lithographic Technique Using Total Reflection of X-Rays from a Pattern Plate
- Study on Impurity Diffusion in Glow-Discharged Amorphous Silicon
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- Low Temperature Deposition of Silicon Nitride by the Catalytic Chemical Vapor Deposition Method